ST0291 Cerium Boride (CeB6) Sputtering Target

Cerium Boride (CeB6) Sputtering Target Description

The Cerium Boride (CeB6) sputtering target is engineered to provide precise and reliable performance in thin film deposition processes. This target, manufactured using advanced techniques, has a melting point of 2550℃ and a density of 4.77 g/cm³, ensuring stability and durability under high-performance sputtering conditions. With a purity level of ≥99%, it is ideal for advanced applications in semiconductor manufacturing, optical coatings, and the production of microelectronic devices.

Cerium Boride (CeB6) Sputtering Target Applications

- Semiconductor manufacturing: Essential for high-quality thin film deposition in microelectronic devices.
- Optical coatings: Provides a stable substrate for the production of modern optical layers.
- Microelectronics: Utilised in deposition processes that require precision and high purity.
- Research and development: Suitable for experimental studies in materials science and advanced deposition techniques.

Cerium Boride (CeB6) Sputtering Target Packing

Our Cerium Boride sputtering targets are carefully packaged to maintain their excellent condition during storage and transport. The products are vacuum sealed and offered in custom sizes to meet specific customer requirements.

Frequently Asked Questions

Q: What are the main applications of the Cerium Boride sputtering target?
A: It is primarily used for thin film deposition in semiconductor manufacturing, optical coatings, and microelectronics, as well as in research and development of advanced materials.

Q: Which sputtering methods are compatible with this target?
A: The target is compatible with RF, RF-R, and DC sputtering systems, ensuring versatility across various deposition facilities.

Q: How is the high purity (≥99%) of the target achieved?
A: The target undergoes stringent quality controls and cleaning processes during production to ensure its high purity and consistent performance.

Q: Can the shape and size of the target be customised?
A: Yes, the Cerium Boride sputtering target is available in standard disc shapes and can be custom made to meet specific design and operational requirements.

Q: What advantages does the high melting point of 2550℃ offer?
A: The high melting point ensures that the target remains stable and functions reliably under high temperature conditions during the sputtering process.