ST0298 Nickel Boride (Ni2B) Sputtering Target

Nickel Boride (Ni2B) Sputtering Target Description

The Nickel Boride (Ni₂B) Sputtering Target combines superior purity with excellent material properties to deliver outstanding performance in thin film deposition applications. Manufactured under controlled conditions, this target is available in standard disc shapes or can be custom-made to align with your specific needs. Its robust melting point range and optimal density make it ideal for high-temperature processes and ensure reliable film quality.

Nickel Boride (Ni2B) Sputtering Target Applications

· Thin Film Deposition: Provides uniform coating for microelectronics and optical components.
· Microelectronic Fabrication: Ideal for depositing consistent, high-quality films in semiconductor devices.
· Optical Coatings: Enhances reflective and anti-reflective coatings with stable material properties.
· Surface Engineering: Used in sputtering processes to improve surface durability and performance. 

Nickel Boride (Ni2B) Sputtering Target Packing

Our Nickel Boride (Ni2B) Sputtering Targets are packaged under strict quality control to ensure they arrive in pristine condition. Customized packaging options are available to meet specific customer requirements and maintain the integrity of the product during storage and transit.

Frequently Asked Questions

Q: What are the primary applications of the Nickel Boride (Ni2B) Sputtering Target?
A: It is widely used in thin film deposition for microelectronics, optical coatings, and surface engineering, thanks to its high purity and stable material properties.

Q: How does the purity of ≥99% benefit the sputtering process?
A: High purity ensures minimal contamination during deposition, leading to films with superior consistency, performance, and reliability.

Q: Can the shape of the sputtering target be customized?
A: Yes, our Nickel Boride (Ni2B) Sputtering Targets are available as standard discs or can be custom-made to meet specific design and application requirements.

Q: How does the melting point range of 1100-1200℃ affect its performance?
A: The high melting point ensures stability during high-temperature sputtering processes, providing reliable performance and long target life.

Q: What industries can benefit from using this sputtering target?
A: Industries such as microelectronics, optics, semiconductor manufacturing, and advanced surface coatings will benefit from the superior performance and quality of our Nickel Boride (Ni2B) Sputtering Targets.