ST0300 Titanium Boride (TiB2) Sputtering Target

Titanium Boride (TiB2) Sputtering Target Description

The Titanium Boride (TiB2) Sputtering Target is engineered using cutting-edge manufacturing techniques to deliver superior performance in a wide range of industrial applications. With a purity of ≥99% and robust physical properties, this target ensures uniform deposition and long-lasting durability in high-temperature environments. Its excellent thermal and electrical characteristics make it the material of choice for advanced sputtering applications in semiconductor processing, protective coatings, and other critical high-performance sectors.

Titanium Boride (TiB2) Sputtering Target Applications

· Semiconductor Thin Films: Perfect for depositing uniform conductive and protective layers.
· Advanced Coatings: Ideal for RF sputtering to produce wear-resistant surfaces.
· Aerospace Components: Suitable for high-temperature applications requiring durable materials.
· Electronic Devices: Ensures reliable performance in the fabrication of microelectronic components.

Titanium Boride (TiB2) Sputtering Target Packing

Our Titanium Boride Sputtering Target is meticulously packaged to maintain its integrity during storage and transport. The product is vacuum-sealed and available in standardized packaging options such as 5kg per bag, with customized packaging available upon request.

Frequently Asked Questions

Q: What are the typical applications of a TiB2 Sputtering Target?
A: It is widely used in semiconductor thin film deposition, advanced protective coatings, aerospace component manufacturing, and electronic device fabrication.

Q: Why is a high melting point important for sputtering targets?
A: A high melting point ensures that the target can withstand the intense heat generated during the sputtering process without compromising its structural integrity.

Q: How is the Titanium Boride (TiB2) Sputtering Target manufactured?
A: It is produced using advanced manufacturing techniques that guarantee high purity and a uniform material structure, crucial for consistent sputtering performance.

Q: What does RF sputtering entail?
A: RF sputtering uses radio frequency energy to generate a plasma, facilitating the deposition of thin films even on insulating substrates.

Q: Are custom shapes available for the TiB2 Sputtering Target?
A: Yes, our Titanium Boride Sputtering Targets can be manufactured as discs or in custom shapes tailored to specific customer requirements.