ST0313 Tantalum Selenide (TaSe2) Sputtering Target

Tantalum Selenide (TaSe2) Sputtering Target Description

The Tantalum Selenide (TaSe2) Sputtering Target is a precision-manufactured material designed for advanced thin film deposition processes. Manufactured with a purity of ≥99%, this target ensures consistent performance and longevity in demanding industrial applications. Its high melting point and controlled density make it suitable for applications requiring high resistance under extreme processing conditions. This target has been developed using state-of-the-art manufacturing methods and supports high-quality sputter processes in the semiconductor, display, and sensor industries.

Tantalum Selenide (TaSe2) Sputtering Target Applications

- Semiconductor manufacturing: Essential for the deposition of high-quality, uniform layers in the production of microelectronic components.
- Display technologies: Ideal for thin film applications in LCDs, OLED displays, and touch panels.
- Sensor production: Provides reliable film properties required for precision sensors.
- Research and development: Suitable for experimental setups and the development of new thin film materials and coatings.

Tantalum Selenide (TaSe2) Sputtering Target Packing

Our Tantalum Selenide sputtering targets are securely packaged to maintain product integrity during storage and transport.
Vacuum-sealed packaging: Typically 5 kg per bag, larger quantities are available upon request.

Frequently Asked Questions

Q: What applications are best suited for the Tantalum Selenide sputtering target?
A: It is ideal for semiconductor manufacturing, display technology, sensor production, and R&D applications requiring high-quality thin films.

Q: How does the purity of this sputtering target impact performance?
A: A high purity level (≥99%) ensures minimal contamination, leading to improved uniformity of films and higher performance in deposition processes.

Q: Can the target be customised for specific sputtering systems?
A: Yes, available sizes are customisable to meet the specific requirements of various sputtering systems.

Q: What is the significance of the high melting point of this target material?
A: The high melting point (2000℃) ensures that the target can withstand high temperatures during the sputtering process without degradation.

Q: How should the target be stored to maintain its quality?
A: It is recommended to store the target in a clean, dry environment and to use the provided vacuum-sealed packaging to avoid contamination and moisture exposure.