Discontinued (Discontinued) ST0314 Titanium Selenide (TiSe₂) Sputtering Target

Titanium Selenide (TiSe₂) Sputtering Target Description

The Titanium Selenide (TiSe₂) Sputtering Target is engineered for precision thin-film deposition used in semiconductor and optoelectronic manufacturing. Manufactured to a high purity standard (≥99%), this target guarantees excellent performance and reliability in physical vapor deposition processes. Its customizability in shape and size makes it an ideal component in research laboratories and high-tech production lines.

Titanium Selenide (TiSe₂) Sputtering Target Applications

· Semiconductor Device Fabrication: Essential for depositing thin films in integrated circuits and microelectronic devices.
· Photovoltaic Cells: Used in solar cell production to achieve efficient light absorption and energy conversion.
· Optical Coatings: Applied in the manufacturing of sensors and advanced optical components.
· Surface Engineering: Ideal for modifying surface properties in various industrial applications.
· Research and Development: Widely used in labs for material science studies and advanced deposition research.

Titanium Selenide (TiSe₂) Sputtering Target Packing

Our Titanium Selenide Sputtering Targets are carefully packaged to ensure product integrity during storage and transportation. They are securely sealed in anti-static, inert packaging materials, with custom size options available to meet specific customer requirements.

Frequently Asked Questions

Q1: What are the typical applications for Titanium Selenide sputtering targets?
A: They are primarily used in semiconductor fabrication, optical coating processes, photovoltaic cell production, and advanced material research.

Q2: How is the purity level of ≥99% achieved?
A: The material undergoes rigorous purification processes and comprehensive quality control measures, including advanced spectroscopic analysis, to ensure consistently high purity.

Q3: Can custom shapes or sizes be produced?
A: Yes, our Titanium Selenide sputtering targets are available as standard discs or can be custom-made to meet specific design and application requirements.

Q4: What is the significance of the melting point being ~1000℃?
A: The melting point indicates the thermal stability of the material during sputtering processes; however, operational conditions are maintained well below this temperature to ensure consistent performance.

Q5: What storage conditions are recommended for this sputtering target?
A: The target should be stored in a clean, dry environment using anti-static packaging to prevent contamination and maintain material integrity during handling and transport.