ST0317 Aluminium Telluride (AlTe) Sputtering Target

Aluminium Telluride (AlTe) Sputtering Target Description

The Aluminium Telluride (AlTe) sputtering target has been developed using high-precision manufacturing techniques to deliver a product that meets stringent industrial standards. With a purity of ≥99% and the capability to manufacture the target in disc form or customised shapes, it is designed for advanced sputtering processes. Its physical properties, including a melting point of approximately 830℃ and a density of 4.5 g/cm³, ensure its suitability for demanding industrial environments.

Aluminium Telluride (AlTe) Sputtering Target Applications

- Thin film deposition: Ideal for producing uniform, high-quality thin films in the semiconductor and display industries.
- Surface coatings: Used in sputtering systems for the deposition of wear-resistant and conductive coatings on various substrates.
- Microelectronics: Essential for the fabrication of components in microelectronic devices and sensors.
- Research and development: Widely used in academic and industrial R&D facilities to explore new material properties and deposition techniques.

Aluminium Telluride (AlTe) Sputtering Target Packing

Our Aluminium Telluride (AlTe) sputtering targets are packaged under controlled conditions to maintain their integrity. Each target is carefully sealed in protective packaging to ensure safe transport and handling. Custom packaging options are available upon customer request.

Frequently Asked Questions

Q: For which applications is the Aluminium Telluride (AlTe) sputtering target used?
A: It is primarily used for thin film deposition in industries such as semiconductor manufacturing, surface coating, and microelectronics, as well as in research and development laboratories.

Q: How is the target manufactured?
A: The target is manufactured using advanced precision techniques that ensure high purity (≥99%) and uniform properties while meeting strict quality standards.

Q: What forms are available for the sputtering target?
A: The target is available in disc form or can be customised according to specific application requirements.

Q: Can the size of the sputtering target be customised?
A: Yes, the available sizes can be customised to meet the specific requirements of various sputtering systems and applications.

Q: What quality control measures are in place for this product?
A: Our product undergoes strict quality control procedures, including verification of material composition, purity testing, and performance evaluation, to ensure compliance with the highest industrial standards.