Discontinued (Discontinued) ST0318 Antimony Telluride (Sb2Te3) Sputtering Target

Antimony Telluride (Sb2Te3) Sputtering Target Description

The Antimony Telluride (Sb2Te3) sputtering target is a high-performance material optimised for RF sputtering processes. This target is manufactured with precision to ensure a purity of ≥99%, providing a consistent composition and excellent sputtering performance. Its high melting point and tailored density make it essential for the production of thin films in semiconductor devices, sensors, and optical coatings. Furthermore, the ability to create custom shapes offers versatility to meet unique project requirements.

Applications for Antimony Telluride (Sb2Te3) Sputtering Targets

- Thin film deposition: Ideal for the fabrication of semiconductor devices, sensors, and optical coatings.
- Surface coatings: Used for the production of corrosion-resistant and wear-resistant layers for industrial applications.
- Electronics: Suitable for the manufacturing of microelectronic components where uniform thin layers are crucial.
- Optoelectronics: Supports applications in thermoelectric devices and other high-tech systems requiring precise material properties.

Antimony Telluride (Sb2Te3) Sputtering Target Packing

Our Antimony Telluride sputtering targets are carefully packaged to maintain the integrity of the product during storage and transportation. Custom packaging options are available to meet specific customer requirements and ensure that the targets remain undamaged until installation.

Frequently Asked Questions

Q: What benefits does a purity level of ≥99% provide for this sputtering target?
A: A purity level of ≥99% reduces contamination, resulting in uniform film deposition and enhanced overall performance.

Q: Can the target be produced in shapes other than discs?
A: Yes, we offer custom shapes to accommodate specific application requirements.

Q: For which sputtering processes is this target primarily optimised?
A: This sputtering target is optimised for RF sputtering, ensuring uniform and reliable performance.

Q: What industrial applications is this sputtering target best suited for?
A: It is ideal for thin film deposition in semiconductor manufacturing, for surface coatings to increase durability, and for the fabrication of optoelectronic devices.

Q: How is the quality and consistency of the sputtering target ensured?
A: Quality is assured through stringent manufacturing processes and robust quality control measures that ensure each target meets high-performance standards.