ST0331 Tungsten Telluride (WTe2) Sputtering Target

Tungsten Telluride (WTe2) Sputtering Target Description

The Tungsten Telluride (WTe2) Sputtering Target is engineered for reliable performance in modern thin film deposition technologies. Manufactured with a purity of ≥99%, this target is available in custom shapes such as discs or other tailored configurations. It operates effectively under various sputtering modes—including RF, RF-R, and DC—while offering excellent thermal stability with a melting point of 900℃. Its high density of 9.53 g/cm³ further enhances its suitability for high-precision coating and semiconductor applications.

Tungsten Telluride (WTe2) Sputtering Target Applications

· Semiconductor Manufacturing: Enables high-quality thin film deposition for electronic component fabrication.
· Optoelectronics: Supports the development of devices requiring precise deposition and high thermal stability.
· Advanced Coatings: Provides robust, durable layers for protective and functional surface coatings.
· Research and Development: Ideal for material science experiments, nanotechnology studies, and prototype development.

Tungsten Telluride (WTe2) Sputtering Target Packing

Our Tungsten Telluride (WTe2) Sputtering Target is meticulously packaged to maintain its integrity during storage and transportation. Customized packaging options are available, ensuring safe delivery and optimal performance upon arrival.

Frequently Asked Questions

Q: What makes the Tungsten Telluride (WTe2) Sputtering Target ideal for thin film deposition?
A: Its high purity (≥99%), excellent thermal stability (melting point of 900℃), and high density (9.53 g/cm³) ensure uniform, reliable deposition suitable for advanced manufacturing processes.

Q: Which sputtering methods are compatible with this target?
A: The target is designed for use with RF, RF-R, and DC sputtering techniques, providing flexibility for various deposition applications.

Q: Can the sputtering target be customized in shape?
A: Yes, the target is available in standard disc form as well as custom-made configurations to meet specific application requirements.

Q: What are the typical applications for the Tungsten Telluride (WTe2) Sputtering Target?
A: It is widely used in semiconductor manufacturing, optoelectronics, advanced coatings, and research and development, among other high-performance industrial applications.

Q: How is product quality maintained during packaging and shipping?
A: Our sputtering targets are securely packaged using customized solutions that protect the material from damage, ensuring it arrives in optimal condition for immediate use.