ST0336 Calcium Zirconate (CaZrO3) Sputtering Target

Calcium Zirconate (CaZrO3) Sputtering Target Description

The Calcium Zirconate (CaZrO3) sputtering target is designed for highly reliable performance in thin film deposition. Manufactured with a purity of ≥99%, this target offers consistency and durability essential for semiconductor manufacturing and industrial coatings. Its high melting point of 2345℃ and robust density of 5 g/cm³ ensure stable operation even in challenging high-temperature environments.

Calcium Zirconate (CaZrO3) Sputtering Target Applications

- Thin Film Deposition: Suitable for producing high-quality films in semiconductor and electronic device fabrication.
- Surface Coatings: Durable coatings for enhanced performance in industrial applications.
- Advanced Electronics: Used in the production of microelectronic devices and research.
- Industrial Tools: Enhances wear resistance and longevity of coated components.
- Research and Development: Suitable for experimental and innovative coating processes.

Calcium Zirconate (CaZrO3) Sputtering Target Packing

Our Calcium Zirconate sputtering targets are carefully packaged to ensure maximum protection during transport and storage. They are typically packed in moisture-resistant, static-free materials, with packaging options tailored to specific application requirements.

Frequently Asked Questions

Q: What is the main application of Calcium Zirconate sputtering targets?
A: They are primarily used for thin film deposition in semiconductor manufacturing and surface coating processes.

Q: How does the high melting point affect the performance of the sputtering target?
A: The high melting point of 2345℃ ensures stability and reliable performance during high-temperature coating processes and reduces the risk of thermal damage.

Q: In which industries are Calcium Zirconate sputtering targets commonly used?
A: These targets are frequently used in semiconductor manufacturing, electronic device production, industrial coatings, and research.

Q: Can the shapes and sizes of the sputtering targets be customised?
A: Yes, the Calcium Zirconate sputtering targets are available in discs or in bespoke configurations to meet specific application requirements.

Q: How does a purity level of ≥99% affect the efficacy of the sputtering target?
A: A high purity level minimises contamination and ensures the deposition of uniform and high-quality thin films, which is critical for advanced electronics and coating applications.