ST0337 Calcium Ruthenate (CaRuO3) Sputtering Target

Calcium Ruthenate (CaRuO3) Sputtering Target Description

The Calcium Ruthenate (CaRuO₃) sputtering target was developed for efficient sputtering processes used in the semiconductor, thin film, and coating industries. With a composition of CaRuO₃ and a purity of ≥99%, this target provides exceptional thermal stability due to its high melting point of 2100℃ and a density of 5 g/cm³. It is manufactured in disc form or to customer specifications and is suitable for precise and reliable deposition in the production of advanced electronic and photonic devices.

Calcium Ruthenate (CaRuO3) Sputtering Target Applications

- Semiconductor device manufacturing: Essential for producing uniform thin films and conducting layers.
- Thin film deposition: Ideal for solar cells, storage devices, and optical components.
- Coating technologies: For the development of durable, high-performance surface coatings.
- Advanced materials research: Enables precise material deposition for experimental and production setups.

Calcium Ruthenate (CaRuO3) Sputtering Target Packaging

Our calcium ruthenate sputtering targets are carefully packaged to ensure quality and integrity during storage and transport. Each target is securely sealed and available in custom sizes to meet individual customer requirements.

Frequently Asked Questions

Q: What applications are calcium ruthenate sputtering targets best suited for?
A: They are commonly used in semiconductor manufacturing, thin film deposition, and coating applications in industries such as electronics, photovoltaics, and materials research.

Q: Why is a high melting point important for sputtering targets?
A: A high melting point ensures that the target remains thermally stable during high-performance sputtering processes, thereby maintaining its performance and integrity.

Q: Can the targets be customised for specific industrial requirements?
A: Yes, the targets are available in disc form or can be custom made to meet specific size and shape requirements.

Q: How is product quality maintained with a purity of ≥99%?
A: The manufacturing process is strictly controlled and monitored to ensure that each target meets the quality standards required for advanced industrial applications.

Q: What should be considered when selecting a sputtering target material?
A: Key factors include composition, purity, melting point, density, and the specific requirements of the process in which the target will be used.