ST0406 Planar Tungsten (W) Sputtering Target

Planar Tungsten (W) Sputtering Target Description

The Planar Tungsten (W) Sputtering Target is manufactured from ≥99% pure Tungsten and is suitable for high-end applications in thin film deposition. Its planar design and customizable sizes ensure optimal compatibility with various sputtering systems, resulting in uniform coatings and excellent performance in critical industrial processes.

Applications of Planar Tungsten (W) Sputtering Targets

- Semiconductor manufacturing: Ideal for the deposition of Tungsten thin films in the production of integrated circuits.
- Optical coatings: Commonly used in the production of high-quality mirrors and optical filters.
- Energy industry: Utilised for coating components to enhance durability and performance at elevated temperatures.
- Advanced electronics: Provides high reliability for specific electronic devices and sensors.

Planar Tungsten (W) Sputtering Target Packing

Our Planar Tungsten Sputtering Targets are packaged in moisture-resistant, high-integrity packaging to maintain product quality during storage and transport. Options typically include sealed bags and secure boxes tailored to specific customer requirements.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a solid material used in physical vapour deposition to produce thin layers through the sputtering process.

Q: How pure is the Tungsten used in this product?
A: The Tungsten used in this product is ≥99% pure, ensuring reliable and consistent performance.

Q: Can I request a custom shape or size for the sputtering target?
A: Yes, custom shapes and sizes are available to meet specific application requirements.

Q: In which industries are Tungsten sputtering targets commonly used?
A: Tungsten sputtering targets are commonly used in semiconductor manufacturing, optical coating, and advanced electronic applications.

Q: How should the sputtering target be stored?
A: It is recommended to store the target in a clean, dry environment to avoid contamination and maintain its high performance.