ST0458 Neodymium Aluminate (NdAlO3) Sputtering Target

Neodymium Aluminium Oxide (NdAlO3) Sputter Target Description

The Neodymium Aluminium Oxide (NdAlO3) sputter target is a specialized material manufactured for precision sputtering applications. Constructed from high-purity NdAlO3, this target provides excellent performance in thin film deposition processes within demanding industrial environments. It is designed to deliver high thermal stability, consistent sputter yield, and resistance to degradation under extreme conditions, making it ideal for semiconductor, electronics, and modern coating applications.

Neodymium Aluminium Oxide (NdAlO3) Sputtering Target Applications

- Thin Film Deposition: Suitable for generating uniform and high-quality thin films in semiconductor and electronic device manufacturing.
- Modern Coatings: Used for applying wear-resistant and protective coatings in industrial applications.
- Scientific Research: Ideal for laboratory sputter systems needing high-purity targets for experimental processes.
- Aerospace & Energy: Applicable in high-temperature processes where stability and reliability are critical.

Neodymium Aluminium Oxide (NdAlO3) Sputter Target Packaging

Our neodymium aluminium oxide sputter targets are packaged under strict quality controls to maintain product integrity during storage and transport.
- Standard Packaging: Discs are securely packed in moisture-proof materials.
- Custom Packaging: Custom-made targets are supplied according to customer specifications to meet project-specific requirements.

Frequently Asked Questions

Q: What is the primary application of the NdAlO3 sputter target?
A: It is primarily used for thin film deposition in semiconductor manufacturing, for modern coatings, and for precision sputtering applications.

Q: Which industries benefit most from using this sputter target?
A: Industries such as electronics, semiconductor manufacturing, aerospace, and energy benefit from its high thermal stability and consistent performance.

Q: Can the target be customized for specific project requirements?
A: Yes, available sizes and shapes can be tailored to meet the varying demands of different manufacturing processes.

Q: How does the high melting point of 2233 °C affect performance?
A: The high melting point ensures that the target remains stable even at extreme temperatures, providing a consistent sputtering performance.

Q: What quality controls are in place for packaging?
A: Our targets are packed using moisture-proof packaging and custom packaging methods to ensure product integrity during storage and transport.