ST0470 Strontium Manganate (SrMnO3) Sputtering Target

Strontium Manganate (SrMnO3) Sputtering Target Description

The Strontium Manganate (SrMnO3) sputtering target has been specifically developed for advanced applications involving physical vapour deposition. Manufactured with a purity of ≥99%, this target offers consistent performance across various sputtering processes. Its custom-designed disc shapes ensure versatility in design and fabrication, while the Indium and elastomer bonding materials maintain operational stability during the deposition processes. This product is ideal for the production of complex oxide thin films, which are essential for contemporary electronics, sensors, and display technologies.

Strontium Manganate (SrMnO3) Sputtering Target Applications

- Thin film deposition: Suitable for producing high-quality oxide layers in semiconductor devices, sensors, and memory components.
- Display technologies: Used for the deposition of transparent conductive oxides and other functional layers in display panels.
- High-performance ceramics: Utilised in processes requiring precision oxide layers for improved mechanical and electrical properties.
- Research and development: Appropriate for experimental setups where high-purity sputter targets are critical for reliable and reproducible thin film growth.

Strontium Manganate (SrMnO3) Sputtering Target Packaging

Our Strontium Manganate sputtering targets are carefully packaged to ensure their high purity and integrity during transport. Custom packaging solutions are available, ensuring that each disc or custom-fabricated target is securely packed and delivered in pristine condition to meet your specific operational requirements.

Frequently Asked Questions

Q: What is a sputter target?
A: A sputter target is a specially designed component used in physical vapour deposition processes for depositing thin films onto various substrates.

Q: What makes the SrMnO3 sputter target unique?
A: The SrMnO3 sputter target is manufactured with a high purity level (≥99%) and can be custom-made in disc or other forms, ensuring optimal performance and precise layer deposition.

Q: What applications is this sputter target typically used for?
A: It is commonly used in semiconductor manufacturing, display technology, high-performance ceramics, and research where high-quality oxide thin films are required.

Q: What bonding materials are used for this sputter target?
A: The specified bonding materials for this product are Indium and elastomer, which help maintain operational stability during the sputtering process.

Q: Can the available sizes of the sputter target be customised?
A: Yes, the product is available in custom sizes that meet the requirements of various sputtering systems and applications.