ST0474 Titanium Silicate (Ti0.44Si0.10O) Sputtering Target

Titanosilicate (Ti0.44Si0.10O) Sputtering Target Description

The Titanosilicate (Ti0.44Si0.10O) sputtering target is a high-performance material designed specifically for the application of film sputtering. It is produced under strict quality controls, offers a high degree of purity, and is available in standard disc shapes as well as in custom configurations to meet various industrial requirements. This product is designed to provide consistent sputtering performance, ensuring durability and operational efficiency across a range of applications.

Titanosilicate (Ti0.44Si0.10O) Sputtering Target Applications

- Sputtering processes: Ideal for manufacturing thin films in semiconductor and display applications.
- Surface coating: Used for depositing protective or decorative coatings on various substrates.
- Production of electronic devices: Suitable for the precise manufacturing of sensors, displays, and other electronic components.
- Research and development: An excellent choice for materials science studies and experiments in sputtering technology.

Titanosilicate (Ti0.44Si0.10O) Sputtering Target Packaging

Our Titanosilicate sputtering targets are carefully packaged to ensure their integrity during transport. Standard packaging includes high-quality protective materials, but custom packaging options are available depending on customer requirements.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a solid material used in the sputtering process to deposit thin films on various substrates by ejecting atoms from the target material under plasma conditions.

Q: Can this sputtering target be customised?
A: Yes, our Titanosilicate sputtering targets are available in custom shapes and sizes to meet specific application requirements.

Q: How pure is the material?
A: The material is manufactured with a purity level of ≥99%, ensuring high performance and reliability in sputtering applications.

Q: What type of binding is used with this target?
A: The target features an indium and elastomer binding system that ensures secure attachment during the sputtering process.

Q: In which industries are sputtering targets typically used?
A: Sputtering targets are used in semiconductor manufacturing, display technology, electronic device production, and research.