Discontinued (Discontinued) ST0475 Yttrium Ferrite (Y3Fe5O12) Sputtering Target

Yttrium Ferrite (Y3Fe5O12) Sputtering Target Description

The Yttrium Ferrite (Y3Fe5O12) sputtering target is designed to deliver high-performance results in thin film deposition processes. Manufactured to the highest quality standards with a purity of ≥99%, this target is ideal for applications that require precision and reliability. It is available in standard disc formats or custom shapes and is suitable for a wide range of high-tech and research projects.

Yttrium Ferrite (Y3Fe5O12) Sputtering Target Applications

- Thin Film Deposition: Essential for the production of uniform and high-quality layers in semiconductor and display technologies.
- Microelectronics: Used in the fabrication of integrated circuits and advanced electronic devices.
- Optical Coatings: Provides a reliable material source for depositing reflective and anti-reflective coatings.
- Magnetic Devices: Critical for the manufacture of components for magnetic storage and sensor applications.

Yttrium Ferrite (Y3Fe5O12) Sputtering Target Packaging

The product is carefully packaged to ensure its integrity during transport. We offer customised packaging solutions to ensure that the sputtering target reaches our customers in perfect condition and according to their specific requirements.

Frequently Asked Questions

Q1: What is a sputtering target?
A: A sputtering target is a material block used in PVD processes (Physical Vapor Deposition) to produce thin layers on substrates by bombarding its surface with energetic particles.

Q2: What advantages does Yttrium Ferrite (Y3Fe5O12) offer in sputtering applications?
A: Yttrium Ferrite provides a high level of purity and consistent performance, making it suitable for deposition processes that require high-quality film formation in the manufacturing of electronic and optical devices.

Q3: Can the shape of the sputtering target be customised?
A: Yes, the target is available in standard disc shapes or can be custom-made to meet specific design and application requirements.

Q4: Why is a purity level of ≥99% important for sputtering targets?
A: A high purity level minimises the presence of impurities in the thin layers and ensures that the resulting coatings exhibit excellent electrical, optical, and structural properties.

Q5: In which industries are Yttrium Ferrite sputtering targets commonly used?
A: They are frequently used in microelectronics, in the manufacture of optical devices, in magnetic storage systems, and in various applications in modern materials research.