ST0477 Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target

Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target Description

The Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target is engineered to deliver exceptional performance in sputtering and thin film deposition applications. With a composition maintained at a high purity level (≥99%), the target ensures excellent film uniformity, adhesion, and durability in various processes. Its customizable shapes, including discs or bespoke designs, allow optimal integration into diverse manufacturing setups used for semiconductor fabrication, flat-panel displays, and photovoltaic devices.

Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target Applications

· Flat Panel Displays: Ideal for depositing uniform oxide layers essential for display technologies.
· Photovoltaic Cells: Enhances film quality in solar cell manufacturing for improved efficiency.
· Microelectronics: Suitable for forming precise thin films in semiconductor device fabrication.
· Optical Coatings: Used for protective and functional coatings in optical devices.
· Printed Circuit Boards: Provides high-quality sputter coatings that improve electrical performance and durability.

Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target Packing

Our sputtering targets are packaged with care to ensure the highest level of product quality upon delivery. Options include vacuum-sealed packaging and custom-designed solutions to protect the target during storage and transportation, ensuring it remains in pristine condition until used in your manufacturing process.

Frequently Asked Questions

Q: What is the composition of this sputtering target?
A: It is composed of Zinc Oxide with 0.3 wt% Manganese (ZnO/Mn) and is maintained at a purity of ≥99%.

Q: In what forms is the sputtering target available?
A: The target is available in standard disc form, and it can also be custom-made to meet specific application requirements.

Q: What are the common applications for this target?
A: It is widely used in the fabrication of flat panel displays, photovoltaic cells, microelectronics, optical coatings, and printed circuit boards.

Q: How does the high purity of the target affect its performance?
A: The ≥99% purity ensures consistent film deposition, superior adhesion, and uniformity in thin film applications, which is critical for high-performance devices.

Q: Can the packaging of the target be customized?
A: Yes, in addition to standard vacuum-sealed packaging, custom-designed packaging solutions are available to meet the specific storage and transportation needs of your application.