ST0500 Osmium Rubidium (Os/Ru) Sputtering Target

Osmium-Rubidium (Os/Ru) Sputtering Target Description

The Osmium-Rubidium (Os/Ru) sputtering target is a high-performance material designed for advanced industrial applications. This target is manufactured with precision to achieve a purity of ≥99%, making it suitable for thin film deposition in state-of-the-art electronics and coating processes. It is available in standard disc form or can be customised to meet specific application requirements. Its enduring characteristics and versatile design contribute to consistent performance in demanding sputtering processes.

Osmium-Rubidium (Os/Ru) Sputtering Target Applications

- Thin film deposition: Ideal for producing high-quality layers in microelectronics, displays, and solar cells.
- Surface coatings: For depositing protective and decorative layers in various industrial applications.
- Research and development: Supports innovative research and development in advanced materials and semiconductor devices.
- Specialized manufacturing: Suitable for developing complex multilayer structures in high-tech environments.

Osmium-Rubidium (Os/Ru) Sputtering Target Packing

Our Osmium-Rubidium (Os/Ru) sputtering target is packaged carefully to ensure its integrity during storage and transport. The standard packaging includes protective materials to prevent contamination and damage. For bulk orders or customised packaging solutions, please contact our sales department.

Frequently Asked Questions

Q: What is a sputtering target used for?
A: A sputtering target is used in physical vapour deposition processes to apply thin films onto substrates in various industrial applications.

Q: What advantages does using an Osmium-Rubidium target (Os/Ru) provide?
A: The high purity level (≥99%) and customisable shapes make it ideal for consistent, high-performance thin film deposition and coating applications.

Q: Can the targets be tailored to specific requirements?
A: Yes, the targets are available in standard disc forms or can be tailored to meet customer specifications.

Q: How does the sputtering process work with these targets?
A: During sputtering, high-energy ions bombard the target material, ejecting atoms that then deposit onto a substrate to form a thin film.

Q: In which industries are sputtering targets commonly used?
A: Sputtering targets are commonly used in the semiconductor, electronics, display, optics, and coatings industries.