Discontinued (Discontinued) ST0509 Tantalum Titanium (Ta/Ti) Sputtering Target

Tantalum-Titanium (Ta/Ti) Sputtering Target Description

The Tantalum-Titanium (Ta/Ti) Sputtering Target is designed for high performance in sputtering coating processes. Manufactured with precision and a purity of ≥99%, this target ensures uniform layer thickness and excellent adhesion in various coating applications. By employing advanced production techniques from Stanford Advanced Materials, it meets the stringent requirements of the contemporary semiconductor and electronics industry. The combination of Tantalum and Titanium provides unique properties that enhance sputtering efficiency and layer quality in diverse operational environments.

Tantalum-Titanium (Ta/Ti) Sputtering Target Applications

- Thin film deposition: Ideal for producing uniform coatings in semiconductors and microelectronic devices.
- Display manufacturing: Suitable for creating precise layers in flat panel displays and OLED screens.
- Optical coatings: For depositing high-quality reflective and anti-reflective layers.
- Industrial coatings: For creating wear-resistant and corrosion-protective surfaces for various industrial tools.

Tantalum-Titanium (Ta/Ti) Sputtering Target Packing

Our Tantalum-Titanium (Ta/Ti) Sputtering Target is securely packaged to ensure its integrity during transport and storage.
Vacuum-sealed packaging: 5 kg per package, 25 kg per barrel. The packaging options can be customised to meet specific customer requirements.

Frequently Asked Questions

Q: What are the main advantages of using a Ta/Ti sputtering target?
A: Ta/Ti sputtering targets offer high purity and uniformity that ensure even thin film deposition and enhanced layer adhesion in semiconductor and coating applications.

Q: Can the available sizes be customised for specific equipment?
A: Yes, the available sizes are fully customisable to meet the specific dimensions required for various sputtering systems.

Q: How does the type of bonding affect the performance of the sputtering target?
A: The use of Indium and elastomer bonds provides improved thermal stability and minimizes stress during the sputtering process, leading to enhanced durability and performance of the target.

Q: Which industries can benefit from using the Ta/Ti sputtering target?
A: Industries such as semiconductor manufacturing, display technology, optics, and industrial coatings benefit from the high performance and reliability of the Ta/Ti sputtering target.

Q: How is the purity of ≥99% maintained during manufacturing?
A: The purity is achieved through stringent quality controls and advanced refining processes that ensure each sputtering target meets the high standards required for precision applications.