Discontinued (Discontinued) ST0512 Zirconium Yttrium (Zr/Y) Sputtering Target

Zirconium Yttrium (Zr/Y) Sputtering Target Description

The Zirconium-Yttrium (Zr/Y) sputtering target is designed to deliver exceptional performance in precision thin film deposition. This sputtering target is manufactured with a Zr/Y composition and a purity of ≥99%, available in discs or custom designs to meet specific process requirements. The use of advanced bonding techniques employing indium and elastomer ensures reliable adhesion and uniform deposition, making it an ideal choice for industrial high-tech applications. Its outstanding material properties contribute to excellent layer quality, durability, and process stability.

Zirconium Yttrium (Zr/Y) Sputtering Target Applications

- Semiconductor devices: Essential for the production of integrated circuits and microelectronic components.
- Optical coatings: Ideal for depositing high-quality reflective and anti-reflective layers in optical devices.
- Surface engineering: Enhances substrate performance through durable, corrosion-resistant coatings.
- Research and development: Widely used in experimental setups for the development of next-generation thin film technologies.

Zirconium Yttrium (Zr/Y) Sputtering Target Packaging

Our sputtering targets are packaged with the utmost care to maintain material integrity. Each target is securely packed in custom containers, equipped with options such as anti-static measures and moisture control, ensuring optimal quality during storage and transport.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a high-purity material used in physical vapour deposition processes, where atoms from the target material are ejected and deposited onto a substrate to form thin films.

Q: What advantages does the zirconium-yttrium sputtering target offer?
A: It provides a high level of purity, customizable shapes, and reliable performance that ensures uniform and high-quality deposition of thin films for advanced industrial applications.

Q: How is the quality of the zirconium-yttrium target ensured?
A: Our manufacturing process includes stringent quality control measures to achieve and maintain a purity level of ≥99%, ensuring optimal performance in demanding applications.

Q: Can the target be customised to specific size requirements?
A: Yes, the sputtering target is available in standard disc forms or can be custom-made to fulfil specific process specifications.

Q: In which industries is this sputtering target typically employed?
A: It is ideally used in semiconductor manufacturing, microelectronics, optical coatings, and research and development for advanced thin film applications.