Discontinued (Discontinued) ST0517 Zirconium Oxide with Calcium Oxide (ZrO2/CaO) Sputtering Target

Zirconium Oxide with Calcium Oxide (ZrO2/CaO) Sputtering Target Description

The Zirconium Oxide with Calcium Oxide (ZrO2/CaO) sputtering target is designed for optimal performance in sputtering applications. Manufactured with a high-purity composition (≥99%), this target ensures consistent deposition and improved film uniformity. It is optimised for use in microelectronics, semiconductor manufacturing, and advanced coating processes. Its customisable forms and packaging ensure integration into various manufacturing environments. The unique formulation provides excellent chemical stability and adhesion properties, making it suitable for applications where reliability and precision are crucial.

Zirconium Oxide with Calcium Oxide (ZrO2/CaO) Sputtering Target Applications

- Semiconductor manufacturing: Essential for the production of microelectronics and integrated circuits.
- Thin film deposition: Ideal for producing uniform and high-quality coatings in optical devices and sensors.
- Advanced coating processes: For the application of protective, wear-resistant layers on industrial components.
- Research and development: Suitable for experimental sputtering techniques in academic and industrial laboratories.

Zirconium Oxide with Calcium Oxide (ZrO2/CaO) Sputtering Target Packaging

Our sputtering targets are securely packaged to ensure optimal quality during storage and transport. Each target is vacuum-sealed and available in customised packaging to meet customer requirements.

Frequently Asked Questions

Q: What advantages does the ZrO2/CaO sputtering target offer in thin film deposition?
A: The high purity (≥99%) and stable composition of the ZrO2/CaO sputtering target enable uniform film deposition with excellent adhesion and minimal defect formation.

Q: Can the target be customised in terms of shape and size?
A: Yes, the target is available in the form of discs or tailored configurations to meet the specific requirements of the sputter system.

Q: Which industries benefit the most from using this sputtering target?
A: Industries such as semiconductor manufacturing, thin film optics, modern coatings, and research laboratories benefit from the reliable performance and consistent film quality of the target.

Q: How is the quality of the sputtering target ensured?
A: The target is manufactured under strict quality control measures using high-purity materials and advanced processing techniques to guarantee performance and consistency.

Q: What packaging options are available for the sputtering targets?
A: The targets are vacuum-sealed and can be packaged in various sizes according to customer preferences to ensure safe transport and storage.