ST0521 Vanadium Boride (VB2) Sputtering Target

Vanadium Boride (VB2) Sputtering Target Description

The Vanadium Boride (VB2) sputtering target was designed for precise and reliable performance across a wide range of sputtering applications. This target is manufactured using advanced techniques, providing excellent uniformity and purity that ensures a high-quality thin film deposition. Its characteristics make it suitable for applications where thermal stability, wear resistance, and consistent sputtering behaviour are critical. Customisable shapes of the product offer flexibility to meet specific industrial requirements.

Vanadium Boride (VB2) Sputtering Target Applications

- Thin film deposition: Essential for the production of uniform layers in the semiconductor and microelectronics industries.
- Surface coatings: Enhances the wear resistance and durability of industrial tools and machine components.
- Advanced research: Widely used in research laboratories for materials science and nanotechnology experiments.
- Industrial manufacturing: Supports production processes in optics, energy devices, and precision instruments.

Vanadium Boride (VB2) Sputtering Target Packaging

Our Vanadium Boride sputtering targets are carefully packaged to maintain their high purity and structural integrity during transportation and storage.
Packaging options: Vacuum-sealed, custom-tailored packaging that ensures minimal exposure to contaminants.

Frequently Asked Questions

Q: What is Vanadium Boride (VB2) used for in sputtering applications?
A: VB2 serves as a sputtering target for thin film deposition in the semiconductor and optics industries, as well as for various industrial coating applications due to its excellent thermal and wear-resistant properties.

Q: How are the shapes of sputtering targets customised?
A: Customers can specify the required dimensions and form factors during the ordering process to ensure that the target meets the specific requirements of their sputtering system.

Q: What precautions should be taken when handling and storing VB2 sputtering targets?
A: Targets should be handled with care to avoid contamination from moisture or dust and stored in a controlled environment to preserve their purity and performance.

Q: Does the absence of a defined melting point affect the sputtering process?
A: The lack of a defined melting point is typical for such compounds and does not impact the performance of the targets in sputtering applications, as the process conditions are optimised for VB2 properties.

Q: Are there any quality guarantees for VB2 sputtering targets?
A: Yes, Stanford Advanced Materials provides a quality guarantee ensuring that VB2 targets meet stringent industry standards for purity and performance.