ST0522 Lead Fluoride (PbF2) Sputtering Target

Lead Fluoride (PbF2) Sputtering Target Description

The Lead Fluoride (PbF2) sputtering target has been developed to achieve excellent performance in sputtering and thin film deposition processes. With a purity of ≥99% and customizable shapes, it offers consistent efficiency for industrial and laboratory applications. This target, designed for reliability, maintains its integrity even under stringent processing conditions, ensuring high-quality results with every use.

Lead Fluoride (PbF2) Sputtering Target Applications

- Semiconductor manufacturing: Ideal for sputtering processes and thin film deposition in semiconductor devices.
- Thin film deposition: Enables uniform coatings and excellent film quality in optical and electronic applications.
- Laboratory research: Suitable for materials science studies and experimental sputtering setups.
- Surface treatment: Improves adhesion and durability of layered systems and specialised applications.
- Custom industrial processes: Adaptable to various configurations and setups requiring precision sputtering targets.

Lead Fluoride (PbF2) Sputtering Target Packaging

The Lead Fluoride (PbF2) sputtering target is delivered in a vacuum-sealed package to ensure optimal protection and preservation of material quality. Packaging options include 5 kg per bag or 25 kg per drum, prepared to comply with stringent storage and transport standards.

Frequently Asked Questions

Q: What are the recommended storage conditions for the Lead Fluoride (PbF2) sputtering target?
A: It should be stored in a dry, temperature-controlled environment protected from moisture and direct sunlight to maintain its purity and integrity.

Q: Can the target be customised for different sputtering systems?
A: Yes, the target is available in bespoke shapes to meet specific equipment requirements.

Q: Which industries benefit most from using this sputtering target?
A: It is ideal for semiconductor manufacturing, thin film deposition, advanced research laboratories, and various industrial sputtering processes.

Q: Are there any special handling precautions for this material?
A: Standard protocols for laboratory and industrial handling should be followed, including the use of personal protective equipment to avoid contamination or damage.

Q: How does the high purity of this target affect its performance?
A: The high purity (≥99%) ensures consistent sputter performance, resulting in uniform thin films and increased process reliability.