ST0533 Lithium Tetrachloroaluminate Sputtering Target

Lithium-Tetrachloraluminate Sputtering Target Description

The Lithium-Tetrachloraluminate Sputtering Target is engineered to ensure high consistency and efficiency in sputtering applications. This target is manufactured with a purity level of ≥99%, providing excellent performance in deposition processes. With its versatile forms, including discs or custom configurations, it is suited for specialised processes requiring controlled material properties. Its unique composition supports applications necessitating precise uniformity and reliability of thin films, making it a preferred choice for critical industrial applications.

Lithium-Tetrachloraluminate Sputtering Target Applications

- Semiconductor Manufacturing: Essential for the sputter coating in microelectronics.
- Optical Coatings: For the production of optical precision components requiring controlled thin films.
- Surface Treatment: Ideal for providing uniform and high-performance coatings on various substrates.
- Research and Development: Suitable for research applications in advanced materials science.

Lithium-Tetrachloraluminate Sputtering Target Packaging

Our Lithium-Tetrachloraluminate Sputtering Targets are customised to meet your specific requirements. Standard packaging options include vacuum-sealed containers for smaller quantities and bulk packaging for large orders, ensuring product integrity during storage and transport.

Frequently Asked Questions

Q: What are the main applications of the Lithium-Tetrachloraluminate Sputtering Target?
A: It is primarily employed in semiconductor manufacturing, optical coatings, surface treatment, and research applications for the deposition of thin films.

Q: What does a purity level of ≥99% indicate for this sputtering target?
A: A purity level of ≥99% ensures minimal contaminants, which is critical for precise and reliable sputter performance in sensitive applications.

Q: Are custom sizes available for the Lithium-Tetrachloraluminate Sputtering Target?
A: Yes, the target is available in customised shapes and sizes to meet specific application requirements.

Q: How does the melting point influence the sputtering process?
A: The melting point of 143 °C is a key parameter during the sputtering process, ensuring controlled material behaviour under operating conditions.

Q: What should I consider when storing Lithium-Tetrachloraluminate Sputtering Targets?
A: It is important to store the targets in a dry, temperature-controlled environment and to follow the recommended packaging guidelines to maintain product integrity over time.