Discontinued (Discontinued) ST0883 Gallium Nitride Sputtering Targets, GaN

Gallium Nitride Sputtering Target Description

The Gallium Nitride sputtering targets, GaN, serve as a high-performance material tailored for advanced applications in semiconductor and electronics manufacturing. These targets, produced under stringent quality controls and high purity standards, facilitate precise and uniform film deposition, which is critical for high-tech applications. They exhibit exceptional thermal and chemical stability, making them suitable for use in harsh processing environments and ensure a prolonged lifespan during manufacturing processes.

Applications for Gallium Nitride Sputtering Targets

- Semiconductor Device Manufacturing: Essential for depositing high-quality thin films used in integrated circuits and power electronics.
- LED and Laser Diodes: Indispensable for the production of efficient light-emitting components.
- RF and Microwave Devices: Utilised in the fabrication of electronic high-frequency components.
- Optoelectronic Devices: Ideal for manufacturing transparent conductive films and advanced sensors.
- Research and Development: Widely used in experimental setups and pilot production lines for new electronic materials.

Gallium Nitride Sputtering Target Packing

Our Gallium Nitride sputtering targets are carefully packaged to ensure their quality and integrity. They are vacuum-sealed and securely packaged, tailored to customer specifications. Custom packaging options are also available to meet specific application and shipping requirements.

Frequently Asked Questions

Q: For which applications are Gallium Nitride sputtering targets best suited?
A: They are ideal for the manufacture of semiconductor devices, LED and laser diodes, RF components, and various research and development applications where high-quality film deposition is critical.

Q: What advantages does the high purity (≥99%) of GaN targets offer for the sputtering process?
A: The high purity ensures minimal contamination in the deposited layers, resulting in improved electrical and optical properties and enhanced overall device performance.

Q: Are custom shapes and sizes available for these sputtering targets?
A: Yes, the targets can be produced as disks or in customised shapes and sizes according to specific application requirements.

Q: What makes GaN a preferred material for modern electronics?
A: GaN demonstrates excellent thermal stability, high breakdown voltage, and exceptional chemical resistance, which are essential for high-performance electronic and optoelectronic devices.

Q: What storage conditions are recommended to maintain the quality of Gallium Nitride sputtering targets?
A: It is recommended to store the targets in a clean, dry environment under controlled temperature conditions and in their vacuum-sealed original packaging to avoid contamination and degradation.