ST0887 Titanium Aluminum Silicon Sputtering Target, Ti/Al/Si

Titanium Aluminium Silicon Sputtering Target Description

The Titanium Aluminium Silicon Sputtering Target, Ti/Al/Si, is engineered to deliver exceptional performance in thin film deposition processes. With a high purity of ≥99% and the option for custom-made shapes, this target is optimised for consistency and precision in advanced manufacturing environments. It provides a reliable solution for applications that require uniform film deposition, ensuring enhanced durability and performance in the final products.

Titanium Aluminium Silicon Sputtering Target Applications

· Thin Film Deposition: Ideal for creating uniform, high-quality thin films in semiconductor and microelectronic fabrication.
· Microelectronics: Essential for integrated circuit production and other electronic component manufacturing.
· Optoelectronics: Used in the development of LEDs, solar cells, and various optical devices.
· Surface Engineering: Applied to modify surface properties for improved wear resistance and performance in industrial coatings.

Product Comparison

Titanium Aluminium Silicon Sputtering Target Packing

Our Titanium Aluminium Silicon Sputtering Target is carefully packaged to maintain its superior quality during storage and transportation. Available packaging options include vacuum-sealed solutions tailored to meet your specific production requirements.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material source used in physical vapour deposition processes, where energetic particles eject atoms from the target to form thin films on substrates.

Q: How does the high purity (≥99%) benefit the sputtering process?
A: High purity ensures consistent film properties by reducing contamination, resulting in higher performance and reliability of the deposited layers.

Q: Are the shapes of the sputtering target customisable?
A: Yes, the Titanium Aluminium Silicon Sputtering Target is available in standard disc shapes or can be custom-made to meet specific equipment and application requirements.

Q: Which industries benefit most from using sputtering targets?
A: Sputtering targets are widely used in the semiconductor, microelectronics, optoelectronics, and surface engineering industries.

Q: How is the Titanium Aluminium Silicon Sputtering Target used in thin film deposition?
A: The target is installed in a sputtering system where it is bombarded with energetic particles, causing atoms to be ejected and then deposited onto a substrate, forming a uniform thin film.