Discontinued (Discontinued) ST0887 Titanium Aluminum Silicon Sputtering Target, Ti/Al/Si

Titanium-Aluminium-Silicon Sputtering Target Description

The Titanium-Aluminium-Silicon Sputtering Target, Ti/Al/Si, has been developed to achieve exceptional performance in thin film deposition processes. With a high purity of ≥99% and the ability to manufacture custom shapes, this target is optimised for consistency and precision in advanced manufacturing environments. It provides a reliable solution for applications requiring uniform film deposition, ensuring enhanced durability and performance of the final products.

Titanium-Aluminium-Silicon Sputtering Target Applications

- Thin Film Deposition: Ideal for producing uniform, high-quality thin films in semiconductor and microelectronics manufacturing.
- Microelectronics: Essential for the production of integrated circuits and other electronic components.
- Optoelectronics: Used in the development of LEDs, solar cells, and various optical devices.
- Surface Engineering: Employed to modify surface properties to improve wear resistance and performance of industrial coatings.

Titanium-Aluminium-Silicon Sputtering Target Packing

Our Titanium-Aluminium-Silicon Sputtering Targets are carefully packaged to maintain their exceptional quality during storage and transport. Available packaging options include vacuum-sealed solutions tailored to your specific production needs.

Frequently Asked Questions

Q: What is a Sputtering Target?
A: A Sputtering Target is a material source used in physical vapor deposition processes where energetic particles eject atoms from the target to form thin films on substrates.

Q: What benefit does high purity (≥99%) have for the sputtering process?
A: High purity ensures consistent film properties by reducing contaminants, leading to greater performance and reliability of the deposited films.

Q: Are the shapes of the sputtering targets customisable?
A: Yes, the Titanium-Aluminium-Silicon Sputtering Target is available in standard disc shapes or can be custom-made to meet specific device and application requirements.

Q: Which industries benefit the most from the use of sputtering targets?
A: Sputtering targets are employed in the semiconductor industry, microelectronics, optoelectronics, and surface engineering.

Q: How is the Titanium-Aluminium-Silicon Sputtering Target used in thin film deposition?
A: The target is installed in a sputtering system, where it is bombarded with energetic particles that eject atoms which then deposit onto a substrate, forming a uniform thin film.