ST0903 Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target, Co/Ni/V

Cobalt-Nickel-Vanadium High-Entropy Alloy (HEA) Sputtering Target Description

The sputtering target made from a Cobalt-Nickel-Vanadium High-Entropy Alloy (HEA), Co/Ni/V, is manufactured with high precision to meet the demanding requirements of modern thin film deposition processes. This target, produced using advanced manufacturing techniques, offers a high purity level (≥99%) and is available in discs or customised shapes. Its unique alloy composition ensures excellent performance in sputtering applications, making it suitable for both research and industry.

Cobalt-Nickel-Vanadium High-Entropy Alloy (HEA) Sputtering Target Applications

- Thin film deposition: Ideal for producing uniform thin films in the semiconductor and microelectronics industry.
- Surface coatings: Provides excellent performance for high-quality coatings for optics and protective layers.
- Advanced research: Widely used in materials science and nanotechnology research for experimental deposition processes.
- Industrial manufacturing: Suitable for precision applications across several high-tech manufacturing sectors.

Cobalt-Nickel-Vanadium High-Entropy Alloy (HEA) Sputtering Target Packaging

Our sputtering targets are handled with utmost care during storage and transport to maintain product integrity. They are typically packaged in secure, clean, and protective packaging solutions. Specific packaging configurations can be customised based on production requirements and customer preferences.

Frequently Asked Questions

Q: What is a sputtering target and how is it used?
A: A sputtering target serves as a material source used in physical vapor deposition processes for depositing thin films onto substrates essential for electronics, optics, and other high-tech applications.

Q: Can the shapes of sputtering targets be customised?
A: Yes, our targets are available as standard discs or can be tailored according to specific size or design requirements.

Q: Which industries typically utilise Co/Ni/V sputtering targets?
A: Industries such as semiconductor manufacturing, optical coatings, advanced materials research, and industrial manufacturing frequently utilise these targets.

Q: What advantages does a purity level of ≥99% bring to the sputtering process?
A: A high purity level ensures consistent and contamination-free deposition, which is crucial for producing high-performance thin films in sensitive and precise applications.

Q: What should be considered when storing and handling these sputtering targets?
A: It is recommended to store sputtering targets in a clean, dry, and controlled environment to avoid contamination. They are typically packaged in secure, vacuum-sealed packaging to preserve their quality during transport.