ST0937 Cobalt Silicide Sputtering Target, CoSi2

Cobalt Silicide Sputtering Target Description

The Cobalt Silicide Sputtering Target, CoSi2, is a high-quality material designed for high-performance sputter applications. It is manufactured with precise control, offers a purity of ≥99%, and is available in disc form or as customised pieces. Its exceptional melting point and uniform density ensure reliable performance in demanding environments. The target is particularly suited for applications in semiconductor manufacturing, thin film deposition, and advanced material coating processes, making it an essential component of modern industrial techniques.

Applications for Cobalt Silicide Sputter Targets

- Semiconductor manufacturing: Widely used for the deposition of thin films for integrated circuits and microelectronic devices.
- Thin film deposition: Provides a stable source for sputtering processes to produce uniform thin films on various substrates.
- Coating processes: Ideal for surface modification to enhance the conductivity and durability of components.
- Precision instrumentation: Used in the manufacture of sensors and optical devices, where high purity and consistency are critical.

Cobalt Silicide Sputter Target Packaging

Our Cobalt Silicide Sputter Targets are handled with utmost care to maintain their flawless condition during storage and transport.
- Custom packaging options are available to meet specific customer requirements.
- Standard packaging includes vacuum-sealed containers or protective coverings to prevent contamination and damage.

Frequently Asked Questions

Q: What is a sputter target?
A: A sputter target is a material source used in physical vapor deposition processes, where atoms are ejected from the target to form thin layers on substrates.

Q: How does the purity level of the sputter target affect its performance?
A: A higher purity level (≥99% in this case) ensures minimal contamination during sputtering, resulting in consistent film quality and improved performance of the final product.

Q: In which industries are Cobalt Silicide sputter targets typically used?
A: They are employed in semiconductor manufacturing, thin film deposition, and advanced coating processes in electronics and precision instrumentation.

Q: Can the target be customised in size or shape?
A: Yes, the product is available in the form of discs or as custom-made solutions according to specific application requirements.

Q: What are the key benefits of using a CoSi2 sputter target?
A: The high melting point, uniform density, and excellent purity render CoSi2 an ideal material for reliable and consistent sputtering, ensuring high-quality film production in advanced industrial applications.