ST0938 Copper (II) Telluride Sputtering Target, CuTe

Copper (II) Telluride Sputtering Target Description

The Copper (II) Telluride sputtering target CuTe is a high-performance material specifically designed for sputtering applications. It is manufactured according to rigorous industrial standards using advanced processing techniques, ensuring high purity (≥99%) and excellent stability. With a melting point of 1,125 °C and a density of 7.1 g/cm³, this target meets demanding requirements in the production of semiconductor devices, thin film deposition, and optical coating processes. Its customizable shapes, including discs or bespoke forms, provide versatile solutions for various industrial needs.

Copper (II) Telluride Sputter Target Applications

- Thin Film Deposition: Ideal for manufacturing uniform thin films in semiconductor and optoelectronic devices.
- Semiconductor Manufacturing: Used in the production of integrated circuits and advanced electronic components.
- Optical Coatings: Suitable for the deposition of reflective or anti-reflective layers in high-precision optical systems.
- Photovoltaic Cells: Enhances performance in the fabrication of solar cells through effective layer deposition.
- MEMS Components: Supports the production of micro-electromechanical systems requiring precise material properties.

Copper (II) Telluride Sputtering Target Packing

Our Copper (II) Telluride sputtering target is packaged under controlled conditions to maintain its integrity and purity. It is delivered in protective, sealed containers with custom size options to meet specific customer requirements and to ensure safe storage and transport.

Frequently Asked Questions

Q: What is sputtering and how does the Copper (II) Telluride target function in this process?
A: Sputtering is a physical vapour deposition process where atoms are ejected from a solid target material through bombardment by energetic particles. The Copper (II) Telluride target serves as a high-purity material source essential for the fabrication of precise thin films in advanced industrial processes.

Q: How is the purity level of ≥99% maintained in the Copper (II) Telluride target?
A: The material is processed using advanced cleaning techniques and stringent quality control measures to ensure impurities are minimised and a purity level of ≥99% is achieved.

Q: Can the shape of the sputter target be customized?
A: Yes, the target is available in standard disc shapes and can also be custom-manufactured to meet specific design requirements and application needs.

Q: Which industries benefit from using the Copper (II) Telluride sputter target?
A: Industries such as semiconductor manufacturing, optical coatings, photovoltaic cell production, and MEMS component fabrication benefit from the exceptional performance of the target.

Q: How should the Copper (II) Telluride sputtering target be stored to maintain its quality?
A: It should be stored in a controlled environment, preferably in the sealed original packaging, away from contaminants, moisture, and extreme temperature fluctuations, to preserve its integrity.