Discontinued (Discontinued) ST0946 Gallium Arsenide Sputtering Target, GaAs

Gallium Arsenide Sputtering Target Description

The Gallium Arsenide sputtering target, GaAs, is designed for high performance in high-tech coating applications. It is manufactured under stringent quality controls, with a purity of ≥99%, and is available in custom shapes such as discs. This target is engineered to ensure uniform material distribution during the sputtering process, thereby maintaining consistent performance in the production of semiconductor devices and optoelectronic applications. Its unique composition makes it ideal for achieving high precision and reliability, even under challenging conditions.

Gallium Arsenide Sputtering Target Applications

- Semiconductor manufacturing: Ideal for producing thin films used in integrated circuits and radio frequency devices.
- Optoelectronic devices: Utilised in the production of LEDs, laser diodes, and photodetectors.
- Surface coatings: Employed in sputtering processes to deposit uniform layers onto various substrates.
- Research and development: Widely used in experimental setups for developing advanced electronic and photonic systems.

Gallium Arsenide Sputtering Target Packing

Our Gallium Arsenide sputtering target is carefully packaged in vacuum-sealed protective containers to maintain its purity and integrity during storage and transport. Custom packaging options are also available to meet specific customer requirements.

Frequently Asked Questions

Q: What are the main applications of the Gallium Arsenide sputtering target?
A: It is primarily used in semiconductor manufacturing, in the production of optoelectronic devices, for surface coating deposition, and in R&D applications in modern electronics.

Q: How is the purity level of ≥99% maintained during the production process?
A: The production process includes stringent quality control measures and state-of-the-art cleaning techniques to ensure that the GaAs target retains its high purity level.

Q: Can the shape and size be customised for specific sputtering systems?
A: Yes, the product is available in the form of discs or tailored shapes and sizes that meet the requirements of various sputtering systems.

Q: What precautions should be taken when handling this sputtering target?
A: It is recommended to handle the target in a clean, controlled environment and with appropriate protective equipment to avoid contamination and ensure safety.

Q: Is the Gallium Arsenide sputtering target suitable for both research and industrial applications?
A: Yes, due to its high performance and reliability, it is suitable for laboratory research as well as for large-scale industrial production in the semiconductor and optoelectronics sectors.