ST0949 Tin Arsenide Sputtering Target, SnAs

Tin Arsenide Sputtering Target Description

The Tin Arsenide (SnAs) sputtering target is produced under stringent quality controls to ensure a high purity of ≥99% and consistent performance in sputtering processes. Its precise chemical composition and customisable form make it suitable for a variety of deposition systems used in the manufacture of semiconductors and optoelectronic devices.

Applications for Tin Arsenide Sputtering Targets

- Thin film deposition: Perfect for the production of uniform, high-quality thin films in semiconductor manufacturing.
- Optoelectronics: Ideal for producing optical coatings and sensor layers with precise properties.
- Research and development: Provides consistent performance for experimental sputtering trials and advanced material studies.
- Component manufacturing: Supports the production of electronic and photonic components that require stable sputtering characteristics.

Tin Arsenide Sputtering Target Packaging

Our Tin Arsenide sputtering target is packaged with utmost care to maintain product integrity during storage and transport. Custom packaging options are available to meet specific handling and shipping requirements, ensuring that the target arrives in optimal condition.

Frequently Asked Questions

Q: For which applications is the Tin Arsenide sputtering target best suited?
A: It is ideal for the deposition of thin films in semiconductor manufacturing, for optoelectronic devices, and for advanced research applications.

Q: How is the high purity of the target maintained at ≥99%?
A: Through stringent quality controls and advanced manufacturing processes that ensure consistency and reliability in each batch.

Q: Are custom shapes available for this sputtering target?
A: Yes, in addition to standard discs, the target can be custom manufactured to meet specific design and equipment requirements.

Q: What sputtering methods can be used with this target?
A: Although the specific sputtering method is listed as N/A, the target is designed to perform well in standard sputtering systems used in semiconductor and thin film applications.

Q: How should the Tin Arsenide sputtering target be stored to ensure optimal performance?
A: It should be stored in a dry, clean environment with minimal exposure to moisture and contaminants, and should be handled carefully to protect its surface integrity.