ST0972 Germanium Phosphide Sputtering Target, GeP

Germanium Phosphide Sputtering Target Description

The Germanium Phosphide Sputtering Target, GeP is designed for high-precision sputtering applications, ensuring reliable performance in advanced thin-film deposition processes. Manufactured to a purity of ≥99% and featuring a melting point of 725 °C, this target is available as standard discs or custom-made shapes to suit specific industrial requirements. The use of an indium bond enhances thermal and mechanical stability, making it an ideal choice for sensitive applications in semiconductor and optoelectronic device fabrication.

Germanium Phosphide Sputtering Target Applications

· Semiconductor Manufacturing: Ideal for the deposition of thin films in microelectronic devices.
· Optoelectronic Devices: Used in the fabrication of sensors and photonic components.
· Advanced Surface Treatments: Provides superior performance in sputter coating processes.
· Research and Development: Suitable for experimental setups in material science and engineering.
· Custom Industrial Processes: Adaptable to specialized requirements through customizable shapes.

Germanium Phosphide Sputtering Target Packing

Our Germanium Phosphide Sputtering Target is carefully packaged to preserve its high purity and structural integrity. Each unit is sealed in moisture-resistant, anti-static packaging to ensure optimal quality during storage and transportation.

Frequently Asked Questions

Q: What is the primary use of the Germanium Phosphide Sputtering Target, GeP?
A: It is primarily used in sputtering processes for thin-film deposition applications, particularly in semiconductor manufacturing and optoelectronic device fabrication.

Q: What does a purity of ≥99% mean for this target?
A: A purity of ≥99% ensures that the target contains minimal impurities, leading to improved deposition quality and reliable performance in sensitive applications.

Q: Can the product be customized?
A: Yes, the Germanium Phosphide Sputtering Target is available in standard disc forms or as custom-made shapes to meet specific technical requirements.

Q: What is the significance of the indium bond used in this product?
A: The indium bond provides excellent thermal and mechanical stability, which is crucial during the high-stress sputtering process, ensuring consistent performance.

Q: Is the Germanium Phosphide Sputtering Target compatible with standard sputtering equipment?
A: Yes, it is designed to work with a variety of sputtering systems, though specific compatibility should be confirmed with your equipment specifications.