ST0981 Potassium Tantalate Sputtering Target, KTaO3

Potassium Tantalate Sputtering Target Description

The Potassium Tantalate sputtering target, KTaO₃, is produced with a purity of ≥99% and is available in discs or custom shapes to meet specific application requirements. This target is designed for advanced sputtering applications and provides consistent performance in the deposition of high-quality thin films on various substrates. It is suitable for use in semiconductor devices, optoelectronics, and dielectric applications, ensuring reliability even under demanding processing conditions.

Potassium Tantalate Sputtering Target Applications

- Thin film deposition: Ideal for the production of dielectric and ferroelectric thin films in semiconductor manufacturing.
- Semiconductor devices: For the fabrication of electronic components requiring high reliability.
- Optoelectronic components: Suitable for applications in sensors and optical devices due to its excellent material properties.
- Research and development: A reliable option for experimental setups in materials science and advanced materials studies.

Potassium Tantalate Sputtering Target Packing

Our Potassium Tantalate sputtering targets are packaged under strict quality control guidelines to ensure they remain uncontaminated and intact during transport and storage. Custom packaging options are available to meet specific customer requirements and ensure safe delivery for both research and industrial applications.

Frequently Asked Questions

Q: Why is Potassium Tantalate (KTaO₃) suitable for sputtering applications?
A: Its high purity (≥99%) and stable chemical properties ensure consistent sputtering performance, resulting in uniform thin film deposition.

Q: Can the shapes of the sputtering targets be customised?
A: Yes, the targets are available in standard discs or can be tailored according to specific customer requirements.

Q: Which industries typically use Potassium Tantalate sputtering targets?
A: They are commonly used in semiconductor manufacturing, optoelectronics, and research laboratories focusing on advanced materials applications.

Q: How does the level of purity affect the performance of the sputtering target?
A: A higher purity level (≥99%) minimises contamination and thereby improves the quality, consistency, and overall performance of the deposited films.

Q: Are there special recommendations for the storage or handling of these sputtering targets?
A: It is recommended to store the targets in a clean, dry environment with controlled temperature and to handle them carefully to avoid contamination and damage.