ST0986 Silicon Dioxide-Zinc Sulphide Sputtering Target, SiO2-ZnS

Silicon Dioxide-Zinc Sulphide Sputtering Target Description

The Silicon Dioxide-Zinc Sulphide sputtering target, SiO2-ZnS, is produced using precision manufacturing methods to ensure exceptional purity (≥99%) and consistency. It is designed for advanced sputtering applications and provides reliable performance in the deposition of thin films and coatings within high-tech industries. Customisable shapes, including standard disc configurations or tailored options, offer versatility for a wide range of applications from microelectronics to research and development.

Applications for Silicon Dioxide-Zinc Sulphide Sputter Targets

- Semiconductor manufacturing: Ideal for the deposition of high-quality thin films on silicon wafers.
- Optoelectronics: For the production of optical coatings for LEDs, displays, and other devices.
- Surface engineering: Provides excellent coating solutions for wear resistance and improved performance of industrial components.
- Research and development: Serves as a critical material for experimental sputtering processes in materials science laboratories.

Silicon Dioxide-Zinc Sulphide Sputter Target Packaging

Our Silicon Dioxide-Zinc Sulphide sputtering targets are packed with utmost care to maintain their pristine condition during storage and transport. Products may be vacuum sealed in special packaging, with options available in standard quantities or bulk orders as per customer requirements.

Frequently Asked Questions

Q: What are the main applications of the Silicon Dioxide-Zinc Sulphide sputter target?
A: It is primarily used for sputtering in semiconductor manufacturing, in the production of optoelectronic devices, in surface engineering, and in research and development.

Q: Can the shape of the sputtering target be customised?
A: Yes, the product is available in standard disc shapes or can be custom-made to meet specific application requirements.

Q: What is the purity level of this product?
A: The Silicon Dioxide-Zinc Sulphide sputtering target has a purity level of ≥99%.

Q: Are the density or melting point specified for this material?
A: No, the parameters of density and melting point are not applicable (N/A) for this product.

Q: How do I inquire about custom orders or bulk packaging?
A: Please contact our sales team with your specifications and packaging requirements. We are pleased to assist with tailored solutions.