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  • ST1007 Zinc Oxide doped with Magnesium Sputtering Target, ZnMgO

    • ST1007 Zinc Oxide doped with Magnesium Sputtering Target, ZnMgO

    Catalogue Number ST1007
    Composition ZnMgO
    CAS Number N/A
    Purity ≥99%
    Shape Discs, or Custom-made

    The Magnesium-doped Zinc oxide sputter target ZnMgO has been developed to ensure reliable performance in sputter processes for modern thin film deposition. Stanford Advanced Materials is committed to providing innovative materials with stringent quality control and a focus on excellent high-performance sputter solutions.

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    LAST RECOMMENDATION

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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