ST1011 Chromium Silicide Sputtering Target, Cr3Si

Chromium Silicide Sputtering Target Description

The Chromium Silicide Sputtering Target, Cr3Si is engineered for precision and high-performance in advanced deposition processes. Manufactured with strict quality controls, this target offers a consistent material integrity for applications requiring superior thin film deposition. Its customizable shapes, such as discs or bespoke formats, ensure versatility across a range of industrial settings. The product’s unique formulation, enhanced by an indium bond, supports reliable performance in high-demand microelectronics and surface treatment applications.

Chromium Silicide Sputtering Target Applications

· Thin Film Deposition: Ideal for applications in semiconductor device fabrication and microelectronics.
· Photovoltaics: Used in the production of high-efficiency solar cells requiring precise material consistency.
· Microelectronics: Supports the deposition of conductive layers in advanced circuit manufacturing.
· Surface Coatings: Provides uniform coating performance in protective and decorative applications.

Chromium Silicide Sputtering Target Packing

Our Chromium Silicide Sputtering Target is packaged with care to maintain product integrity during storage and transport.
Customized packaging options are available to suit specific industry requirements.

Frequently Asked Questions

Q: What are the primary applications of a Chromium Silicide Sputtering Target?
A: It is primarily used for thin film deposition in semiconductor fabrication, photovoltaics, and surface coating applications.

Q: How can I customize the shape of the sputtering target?
A: The targets can be produced as standard discs or customized shapes according to specific industrial requirements.

Q: What does a purity of ≥99% imply for the product performance?
A: A purity of ≥99% ensures high reliability and consistency in performance, crucial for precision industrial applications.

Q: What is the significance of the indium bond in this target?
A: The indium bond helps enhance the target’s adhesion and overall performance during the sputtering process.

Q: Are there any special storage requirements for the Chromium Silicide Sputtering Target?
A: It is recommended to store the target in a dry, stable environment using the provided customized packaging to maintain its quality and performance.