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  • ST1011 Chromium Silicide Sputtering Target, Cr3Si

    • ST1011 Chromium Silicide Sputtering Target, Cr3Si

    Catalogue Number ST1011
    Composition Cr3Si
    CAS Number 12018-36-9
    Purity ≥99%
    Shape Discs, or Custom-made

    Stanford Advanced Materials is known for supplying high-quality materials that meet the strict demands of contemporary industrial applications. Our commitment to innovation and precision manufacturing ensures that each product consistently exceeds performance expectations.

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    LAST RECOMMENDATION

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    Neodymium (Nd) Sputtering Target
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    Niobium (Nb) Sputtering Target
    ST0033 Niobium (Nb) Sputtering Target
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    ST0036 Praseodymium (Pr) Sputtering Target
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    NB0036 Niobium target disc, Nb target disc
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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
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      • 5''
      • 6''
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      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
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      Bonding

      Yes

      • Yes
      • No
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