Lanthan-Nickel-Oxide (LaNiO3) Evaporation Materials Description
Stanford Advanced Materials (SAM) specialises in the production of evaporation materials with a high level of purity. These materials are used in the semiconductor industry, chemical vapour deposition (CVD) and physical vapour deposition (PVD) for display and optical applications. This achievement is the result of the coordinated efforts of our research, production and analysis teams, which have produced evaporation materials that meet industry requirements.
Lanthan-Nickel-Oxide (LaNiO3) Evaporation Materials Features
High Purity: The LaNiO3 evaporation materials are produced with a high degree of purity. This maintains minimal impurities and ensures that the thin-film quality meets the required specifications.
Precise Composition: The composition of Lanthanum (La), Nickel (Ni) and Oxygen (O) is carefully controlled. This meets the specific deposition requirements and yields consistent outcomes.
Uniform Film Thickness: The process allows precise control of the film thickness. Uniformity is maintained across large substrate surfaces, which is necessary for many applications.
Thermal Stability: During deposition, the LaNiO3 materials exhibit thermal stability. This reduces particle ejection and supports the formation of uniformly deposited, defect-free films.
Versatile Applications: The materials are suitable for a range of applications. These include electronics, optics, semiconductor manufacturing and materials research.
Customised Solutions: Customisation options are available. This allows adaptation of the LaNiO3 evaporation materials to meet individual specifications and application requirements.
Lanthan-Nickel-Oxide (LaNiO3) Evaporation Materials Applications
Lanthan-Nickel-Oxide (LaNiO3) evaporation materials can be used in the semiconductor industry, chemical vapour deposition (CVD), physical vapour deposition (PVD), display technology and optical applications.
Electronics: The materials are employed in the production of electronic components such as resistors, capacitors and transistors to improve conductivity and performance.
Optical Coatings: They are applicable for fabricating optical coatings for lenses, mirrors and filters in optics, photonics and imaging.
Semiconductor Manufacturing: They are used in semiconductor manufacturing processes. This includes thin-film deposition for integrated circuits, photovoltaics and microelectronics.
Materials Research: They are employed in materials research studies and in the development of new materials with defined properties.
Surface Engineering: The materials are used to modify surface characteristics, improve wear resistance, reduce friction and protect against corrosion in various technical applications.
Lanthan-Nickel-Oxide (LaNiO3) Evaporation Materials Specifications
- Composition: Lanthanum (La), Nickel (Ni) and Oxygen (O) in precise ratios.
- Purity: High purity materials with minimal impurities to ensure the quality and performance of thin films.
- Forms: Available in various forms including pellets, granules and customised shapes.
- Packaging: Securely packaged in vacuum-sealed containers to maintain purity and quality.
Packaging:
The Lanthan-Nickel-Oxide (LaNiO3) evaporation materials are clearly marked and labelled. This supports efficient identification and quality control, and care is taken to prevent damage during storage or transport.
Why Choose Our Lanthan-Nickel-Oxide Evaporation Materials?
Quality Assurance: The LaNiO3 evaporation materials undergo strict quality control procedures to meet industry standards.
Technical Expertise: An expert team with extensive knowledge in thin-film deposition technology provides technical support and consultation that is suited to specific applications.
Customised Solutions: Customised LaNiO3 evaporation materials are available to meet the specific requirements of thin-film deposition. This ensures precision and performance.
Converters & Calculators
