Tantalum Foil & Tantalum Band Description
The tantalum foils and bands available from Stanford Advanced Materials (SAM) have been manufactured to meet specific industrial requirements. They exhibit a melting point that permits operation under high temperatures, provide corrosion resistance for chemical processing and aerospace applications, and offer the necessary electrical conductivity for use in electronics. The foils and bands are produced to strict chemical composition and dimensional tolerances so that they fulfil the requirements of various technical applications. SAM maintains quality control measures that ensure these tantalum products conform to defined standards and deliver reliable performance in accordance with customer specifications.

Tantalum Foil & Tantalum Band Specification
Condition: Annealed
Product Name
|
Thickness (mm)
|
Width (mm)
|
Length (mm)
|
Material
|
Standard
|
Purity
|
Tantalum Foil
|
0.03–0.07
|
30–200
|
>50
|
UNS R05200, UNS R05400
|
ASTM B708-98
|
≥99.9% or 99.95%
|
Tantalum Strip
|
0.03
|
1–1.5
|
up to 50 000
|
UNS R05200, UNS R05400
|
ASTM B708-98
|
≥99.9% or 99.95%
|
If you require tantalum in thicknesses greater than those specified here, please refer to Tantalum Sheet
Chemical Composition
Element
|
R05200 (%, Max)
|
R05400 (%, Max)
|
C
|
0.01
|
0.01
|
O
|
0.015
|
0.03
|
N
|
0.01
|
0.01
|
H
|
0.0015
|
0.0015
|
Fe
|
0.01
|
0.01
|
Mo
|
0.02
|
0.02
|
Nb
|
0.1
|
0.1
|
Ni
|
0.01
|
0.01
|
Si
|
0.005
|
0.005
|
Ti
|
0.01
|
0.01
|
W
|
0.05
|
0.05
|
Tantalum and Tantalum Alloys
- R05200, unalloyed tantalum, produced using an electron-beam furnace or vacuum arc melting or both.
- R055400, unalloyed tantalum, produced by powder metallurgy consolidation.
- R05255, a tantalum alloy containing 90% tantalum and 10% tungsten, produced using an electron-beam furnace or vacuum arc melting or both.
- R05252, a tantalum alloy comprising 97.5% tantalum and 2.5% tungsten, produced using electron-beam melting or vacuum arc melting or both.
- R05240, a tantalum alloy containing 60% tantalum and 40% niobium, produced using an electron-beam furnace or vacuum arc melting.
Applications of Tantalum Foils and Tantalum Bands
1. Electronics: Tantalum foils are utilised in the manufacture of capacitors for electronic devices. They are employed in the production of components in mobile phones, computers and other electronic equipment.
2. Aerospace: Tantalum is used in the production of parts for aircraft engines, rockets and other components designed for operation at elevated temperatures and in corrosive environments.
3. Chemical Processing: Tantalum is employed in the chemical industry for constructing equipment such as reaction vessels, heat exchangers and pipes designed for handling corrosive substances.
4. Medical Devices: Tantalum is used in certain medical devices. It is incorporated in implants and instruments because it demonstrates compatibility with body fluids.
5. Nuclear Applications: Tantalum is applied in nuclear reactor components and similar applications given its resistance to radiation.
Tantalum Foil and Tantalum Strip Packaging
The tantalum foil and tape are managed carefully to avoid damage during storage and transportation, thereby maintaining the product’s quality in its original condition.
Safety Data Sheet (MSDS) for your reference!
Specification
Product Name
|
Thickness (mm)
|
Width (mm)
|
Length (mm)
|
Material
|
Standard
|
Purity
|
Tantalum Foil
|
0.03-0.07
|
30-200
|
>50
|
UNS R05200, UNS R05400
|
ASTM B708-98
|
≥99.9% or 99.95%
|
Tantalum Strip
|
0.03
|
1-1.5
|
Up to 50000
|
UNS R05200, UNS R05400
|
ASTM B708-98
|
≥99.9% or 99.95%
|
If you require tantalum in thicknesses greater than those shown here, see tantalum sheet.
Density
|
≥16.69 g/cm3
|
Hardness
|
6-6.5Mohs
|
Melting Point
|
2980℃
|
Tensile Strength
|
172-207 MPa
|
Yield Strength
|
103-138 MPa
|
Elongation
|
20-30%
|
Specific Heat Capacity
|
25.41J/g·K
|
Coefficient of Linear Expansion
|
8.5x10-8K-1
|
Thermal Conductivity
|
0.67W/m·K
|
Electrical Conductivity
|
0.081Ω-1cm-1
|
Critical Temperature for Superconductivity
|
4.3K
|