Description of the Iron-Silicon Evaporation Materials
Stanford Advanced Materials offers the Iron-Silicon Evaporation Material. It is a silicide-ceramic evaporation material with the chemical formula FeSi2. High purity FeSi2 deposition materials are used in deposition processes to ensure the formation of layers with consistent quality. Stanford Advanced Materials (SAM) produces evaporation materials with a purity of up to 99,9995% and applies strict quality control procedures to maintain product reliability.
Specification of the Iron-Silicon Evaporation Materials
Specification |
Description |
Material Type |
Ferrosilicon |
Symbol |
FeSi2 |
Appearance/Colour |
Grey tetragonal crystals |
Melting Point |
1 220 °C (2 230 °F; 1 490 K) |
Density |
4,74 g/cm³ |
Purity |
99.9% ~ 99.99% |
Available Forms |
Powder, granules, custom-made |
Application of the Iron-Silicon Evaporation Materials
The Iron-Silicon Evaporation Materials are used extensively in deposition processes, including semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD). Their primary application is in the field of optics, where they are used for wear protection, decorative coatings and developments in display technology.
Packaging of the Iron-Silicon Evaporation Materials
At Stanford Advanced Materials (SAM) the identification and quality control of our Iron-Silicon Evaporation Materials are handled with care. The materials are clearly marked and labelled on the exterior in order to avoid potential damage during storage or transport.