VD0652 Titanium-Cobalt (Ti/Co)-Vapour Deposition Materials

Titan-Kobalt (Ti/Co)-Evaporation Materials Description

Titan-Kobalt (Ti/Co) evaporation materials provide a material specifically formulated for thin film deposition. The alloy combines the properties of titanium and cobalt and is optimised for thin film applications. It was developed with precision and reliability and is employed in various technological domains.

Key Features

1. Combined Alloy – Ti/Co materials combine titanium and cobalt into an alloy that delivers effective performance in thin film deposition processes.

2. High Melting Points – The melting points of titanium (1 668 °C) and cobalt (1 495 °C) ensure that the material maintains stability during high-temperature thin film deposition.

3. High Thermal Stability – The alloy exhibits high thermal stability. This property is essential for processes conducted under elevated temperatures.

4. Multiple Applications – Ti/Co materials are used in several industries, including microelectronics and aerospace, due to their adaptable characteristics.

Specifications for Titan-Kobalt Evaporation Materials

Titan-Kobalt Evaporation Materials Applications

1. Microelectronics – Ti/Co materials are employed in thin film deposition for the fabrication of advanced microelectronic devices.

2. Aerospace Industry – In aerospace, the materials provide thin film coatings for components that operate under high stress conditions.

3. Sensor Technology – These materials are used in sensor applications where precise thin films are required to detect and measure various parameters.

Titan-Kobalt Evaporation Materials - Packaging

The Titan-Kobalt (Ti/Co) evaporation materials are packaged in accordance with strict protocols to maintain their integrity during transport and storage. The materials are vacuum sealed and enclosed in a protective outer package.

Why Choose Our Titan-Kobalt Evaporation Materials?

• High Purity – The Ti/Co materials meet the specified purity standard of 99.9%, thereby ensuring consistency in deposition processes.

• Customisation – The composition and form may be adapted to meet the specific requirements of thin film deposition projects, thereby supporting varied applications.

• Technical Reliability – Backed by thorough technical evaluation, the Ti/Co evaporation materials deliver consistent performance in thin film deposition.

Begin utilising Titan-Kobalt (Ti/Co) evaporation materials in your thin film research. For enquiries, customisation or to place an order, please contact us.