Zirconium-Aluminium (Zr/Al) Evaporation Materials Description
The Zirconium-Aluminium evaporation material from Stanford Advanced Materials is an alloy evaporation material that contains Zr and Al. High-purity Zirconium-Aluminium evaporation materials play an important role in deposition processes to ensure that the deposited film meets rigorous quality standards. Stanford Advanced Materials (SAM) specialises in producing evaporation materials with a purity of up to 99.9995% and employs quality assurance measures to maintain product reliability.
Specifications for Zirconium-Aluminium (Zr/Al) Evaporation Materials
Property |
Value |
Composition |
Zr/Al |
Purity |
99.9% |
Melting Point |
Zirconium: 1 852°C, Aluminium: 660.32°C |
Density |
Zirconium: 6.49 g/cm³, Aluminium: 2.70 g/cm³ |
Thermal Conductivity |
Zirconium: 22 W/m-K, Aluminium: 237 W/m-K |
Thermal Expansion Coefficient |
Zirconium: 5.8 × 10⁻⁶/K, Aluminium: 22.24 × 10⁻⁶/K |
Zirconium-Aluminium (Zr/Al) Evaporation Materials Applications
Zirconium-Aluminium evaporation materials are used in the following applications:
- In deposition processes such as semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD)
- In optics, including wear protection, decorative coatings and displays.
Zirconium-Aluminium (Zr/Al) Evaporation Materials Packaging
The Zirconium-Aluminium evaporation materials are clearly labelled and packaged to facilitate efficient identification and quality control. Measures are taken to ensure that no damage occurs during storage or transport.