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Catalogue Number | CY2536 |
Dimensions | 4" diameter x 0.5 mm |
Material | Si-Ge(2 wt% Ge) |
Orientation | <100> ±0.5° |
Growth Method | Crystallization process |
Silicon-Germanium (Si-Ge) single crystal substrates are widely used as they meet the technical specifications required by various applications. Stanford Advanced Materials (SAM) has over two decades of experience in the production and distribution of Silicon-Germanium (Si-Ge) single crystal substrates.
Related: LiAlO2 crystal substrate, LSAT crystal substrate, LiF crystal substrate, NdGaO3 crystal substrate.
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