Hafnium Boride Evaporation Materials Description
Hafnium boride evaporation material from Stanford Advanced Materials is an oxide‐based evaporation material with the chemical formula HfB2. High‐purity HfB2 evaporation materials are employed in deposition processes to ensure that the deposited layer meets quality requirements.
Stanford Advanced Materials (SAM) has specialised in the production of evaporation materials with a purity of up to 99,9995% and employs quality assurance procedures to ensure product reliability.
Specification of Hafnium Boride Evaporation Materials
Compound Formula |
HfB2 |
Appearance |
Brown to black solid |
Density |
10.5 g/cm³ |
Melting Point |
3,250° C |
Form |
Powder / Pellets / Granulate / Special order |
Applications of Hafnium Boride Evaporation Materials
Hafnium boride evaporation materials are used in the following applications:
- In deposition processes such as semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD).
- For use in optics, including wear protection, decorative coatings and displays.
Packaging of Hafnium Boride Evaporation Materials
Hafnium boride evaporation materials are clearly labelled and marked to facilitate efficient identification and quality control. Special care is taken during storage or transport to avoid damage.