1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S Description
The 1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S is a versatile 5-inch sliding furnace equipped with a resistance heater and an electric sliding motor for efficient rapid heating and cooling. It achieves maximum heating and cooling rates of 2°C and 4°C per second respectively, and is capable of annealing wafers with a diameter of up to 4 inches at temperatures reaching 1200°C. The device is housed in a double-layer steel casing with air cooling to ensure that the temperature of the furnace casing remains at or below 60°C.
1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S Specifications
|
Furnace Construction
|
- Double-layer steel casing with air cooling: ≤60℃
- Separate temperature control unit for remote operation
- Extended heating zone
- Dynamic sliding rails: allow horizontal movement of the furnace from side to side
- Annealing of wafers up to a diameter of max. 4" with quartz boat
- Quartz tube: 5" quartz tube (130mm outer diameter x 120mm inner diameter x 1100mm L) included with airtight flanges
|
|
Power
|
3KW, 208-240VAC, single-phase, 50/60Hz
|
|
Working Temperature
|
- Max. temperature: 1200℃ (<30 min); 1100℃ continuous
- Heating rate: ≤20℃/min
|
|
Sliding Mechanism
|
- Double sliding rails made of Cr-coated steel
- Length of sliding rail: 1200 m
- Sliding range: 450 mm
- Optional: Automated sliding driven by a DC motor and controlled by the temperature controller. Upon completion of the heating programme, the furnace slides from right to left at the set speed. Fans expel the heated areas to achieve rapid cooling.
|
|
Temperature Controller
|
- Two automatic PID controllers with 30 programmable segments to control heating and cooling rates and dwell times.
- Built-in over-temperature and thermoelement break protection.
- Temperature accuracy +/- 1℃.
- RS485 communication port.
- PC control
|
|
Vacuum Controller
|
Limited by a vacuum pump
- 10^-2 Torr can be achieved with a mechanical pump
- 10^-5 Torr can be achieved with a molecular pump
|
|
Net Weight
|
110 kg
|
|
Dimensions
|
1300 x 550 x 600 mm (furnace closed)
1300 x 750 x 850 mm (furnace open)
350 x 250 x 410 mm (control box)
|
|
Warranty
|
- Tube furnaces with quartz tubes are designed for use under vacuum and low pressure < 0.12 MPa
- Warning! For safe operation, a two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI.
- Vacuum pressures can be safely used only up to 1000°C.
|
|
Certificate
|
- CE certified
- An NRTL or CSA certification is available for an additional fee.
|
1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S Applications
- Semiconductor processing: One of the primary applications of RTP furnaces is in the semiconductor industry, where they are used to anneal semiconductor wafers.
- Material synthesis and experimentation: These furnaces are ideal for synthesising new materials, including metals, ceramics, and composites, particularly when processes require precise temperature control and rapid heating and cooling cycles.
- Coatings: RTP is utilised for applying various types of coatings to substrates, including thin films and multilayer coatings, essential for the manufacture of electronic and optical devices.
- Research and development: RTP furnaces are frequently used in scientific research to investigate the effects of high temperatures on various materials and the kinetics of phase transformations.
1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S Packaging
Our 1200C Sliding Tube Furnace for Rapid Thermal Processing OTF-1200X-RTP-5S is carefully handled during storage and transport to maintain the quality of our product in its original condition.
CUSTOMER REVIEWS
No reviews for current products.
Write for Us
Converters & Calculators
