FE10669 Iron Silicon Boron Target (FeSiB Target)

Catalogue Number	FE10669
Composition	Fe, Si, B
Dimensions	Customized
Form	Target

Iron Silicon Boron Target (FeSiB Target) is an iron-based ferro alloy target with controlled silicon and boron additions that optimise its deposition characteristics. Stanford Advanced Materials (SAM) employs high-resolution spectroscopic methods during sputtering process monitoring to ensure uniform compositional distribution. Detailed microstructural analysis and in-situ emission measurements verify target consistency. This systematic quality control minimises variations, supporting precise thin-film fabrication across research and industrial applications.

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FAQ

How do silicon and boron additions affect the sputtering performance of the target?

The inclusion of silicon and boron in the iron matrix refines the microstructure and modifies film adhesion properties during sputtering. These elements can improve target erosion uniformity and control deposition rates, which is beneficial in achieving consistent thin-film layers across substrates.

What quality control methods are implemented during production of the target?

SAM utilises in-situ optical emission spectroscopy coupled with post-production microstructural analysis to monitor alloy consistency. These techniques assist in detecting compositional variances early, thereby ensuring each target maintains the required homogeneity essential for repeatable deposition performance.

Can the target composition be adjusted for specific deposition processes?

Yes, the alloy composition can be tailored to meet specific process requirements. Customers may request modifications in silicon or boron levels to optimise parameters such as deposition rate and film uniformity. Contact us for further customisation details and technical support.

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