ST11166 Aluminum Planar Target, Al Target

Aluminium Planar Target, Al Target Description

Aluminium Planar Target, Al Target is an aluminium sputtering target manufactured with stringent control over planar dimensions and surface finish. The customised dimensions ensure compatibility with a wide range of deposition systems, while the high-purity aluminium minimises inclusions that could impact film uniformity. This product is engineered to optimise sputtering performance in semiconductor and optical coating applications.

Aluminium Planar Target, Al Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Aluminium Planar Target, Al Target Applications

Electronics
- Used as a sputtering target in semiconductor fabrication to achieve uniform thin films by leveraging its controlled planar surface.
- Applied as a deposition source in microelectronic processes to maintain precise film uniformity and thickness.

Industrial
- Employed in photovoltaics as a sputtering target to achieve consistent large-area coatings through its controlled material properties.
- Utilised in optical coating systems to provide a uniform aluminium layer, addressing issues of irregular deposition and enhancing component performance.

Aluminium Planar Target, Al Target Packing

The aluminium planar target is packed in a protective antistatic package and secured with foam padding to mitigate physical shock and prevent contamination. Storage is recommended in a dry, temperature-controlled environment to maintain surface integrity. Custom packaging options, including resealable pouches and branded labeling, are available to suit specific handling and logistics requirements.

Additional Information

Aluminium sputtering targets play a vital role in thin film deposition processes across various industries. The controlled planar surface and customised dimensions allow for precise layer formation and improved coverage uniformity, which is critical for electronic and optical applications. Material processing and quality control techniques, such as electron microscopy and dimensional verification, ensure that the product meets exacting technical standards.

Understanding the interplay between material purity and deposition performance is essential. Advanced machining and purification techniques minimise the risk of defects during processing, thereby enhancing film quality. This broader insight into materials science underscores the importance of stringent production controls in achieving optimal performance for aluminium sputtering targets.