ST11169 Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target

Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target Description

Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target is a sputtering target fabricated from an aluminium alloy with controlled additions of chromium, titanium, and vanadium. The alloying elements are optimised to enhance film deposition uniformity, making it compatible with semiconductor and industrial sputtering systems. Its planar design facilitates uniform coverage and consistent target erosion, ensuring reproducible deposition results in controlled processing environments.

Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target Applications

1.      
Electronics
   - Used as a sputtering target in semiconductor device fabrication to achieve uniform thin film metallisation by leveraging its controlled microstructure.
   - Applied as a deposition medium in microelectronics coating systems to obtain consistent film thickness and adhesion.

2.      
Industrial Coatings
   - Serves as a sputtering target in industrial processes to deposit wear-resistant aluminium alloy films, enhancing surface durability through precise compositional control.
   - Frequently used for coating applications in machinery parts to improve surface hardness and reduce friction by utilising its planar design.

3.      
Research and Development
   - Employed in R&D sputtering experiments for studying alloy deposition characteristics by leveraging customisable dimensions and uniform composition.
   - Used as a model target in materials science research to evaluate film formation dynamics and target erosion behaviour.

Aluminium Chromium Titanium Vanadium Planar Target, AlCrTiV Target Packing

The target is packaged in clean-room grade, anti-static containers with foam padding to prevent mechanical damage and contamination. It is sealed in inert atmosphere packaging to minimise oxidation during storage. Proper storage conditions include a cool, dry environment away from direct sunlight. Custom packaging options, such as additional shock absorption and specific labelling, are available upon request.

Additional Information

Sputtering targets fabricated from complex aluminium alloys serve critical roles in thin film deposition processes. The precise control of alloy composition directly influences the film's microstructure and functional properties, making them essential for high-performance applications in electronics and industrial coatings.

Understanding the interplay between alloying elements and sputtering dynamics is key in materials science research. These targets provide a platform for exploring deposition kinetics and optimising surface characteristics, ultimately advancing applications in semiconductor manufacturing and material engineering.