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ST11174 Cadmium Sulfide Planar Target, CdS Target

Catalogue Number ST11174
Composition CdS
Purity ≥99.99%, or customized
Form Target
Shape Rectangular
Dimensions Customized

Cadmium Sulfide Planar Target, CdS Target is engineered using precise deposition techniques to produce a uniform, flat surface for sputtering applications. Stanford Advanced Materials (SAM) employs systematic process controls including X-ray diffraction and optical microscopy for surface evaluation. The production process emphasises consistent composition and thickness, ensuring the target meets rigorous specifications for semiconductor fabrication processes.

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FAQ

How does the planar uniformity of the CdS target affect sputtering deposition?

A uniform planar surface ensures even sputter yield across the target, resulting in consistent film thickness on substrates. This uniformity reduces process variability and improves device reproducibility during semiconductor fabrication.

What analytical techniques are employed to verify the CdS composition and surface quality?

Techniques such as X-ray diffraction, optical microscopy, and spectroscopic analysis are utilised to assess phase composition and surface uniformity. These measures help maintain precise material characteristics critical for sputtering applications.

Can the target be adapted for different sputtering system configurations?

Yes, the target is produced with customisable dimensions to suit various sputtering chamber requirements. Adjustments in size and mounting features can be made to optimise compatibility with specific semiconductor processing equipment. For further details, contact us.

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