ST11175 Cerium Magnesium Planar Target, CeMg Target

Cerium Magnesium Planar Target, CeMg Target Description

Cerium Magnesium Planar Target, CeMg Target is a sputtering target composed of a carefully balanced cerium-magnesium alloy. Its planar design facilitates consistent film deposition in vacuum processes by ensuring uniform material distribution. The controlled composition supports specific film characteristics essential for advanced electronic, optical, and coating applications, making it a functional material for research and industrial sputtering setups.

Cerium Magnesium Planar Target, CeMg Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Cerium Magnesium Planar Target, CeMg Target Applications

Electronics
- Used as a sputtering target in semiconductor thin-film deposition to achieve uniform film thickness by utilising its consistent alloy composition.
- Applied as a deposition source in optoelectronic device fabrication to enhance film uniformity by employing its controlled chemical makeup.

Industrial
- Employed as a coating target in wear-resistant surface treatments to improve process consistency by utilising its stable alloy structure.
- Integrated in gradient coating systems for optical components to optimise film deposition rates and quality based on its precise material properties.

Scientific Research
- Used in experimental setups for thin-film studies to produce controlled film structures by utilising its exact composition.
- Applied in test environments to analyse sputtering dynamics and film growth kinetics, benefiting from its uniform planar target design.

Cerium Magnesium Planar Target, CeMg Target Packing

Cerium Magnesium Planar Target is packaged in anti-static, corrosion-resistant materials with foam cushioning inside sealed containers to prevent contamination and mechanical damage. The targets are stored under controlled temperature and low-humidity conditions. Custom packaging options, including vacuum-sealed designs and specialised labelling, can be provided to meet specific handling requirements.

Additional Information

Sputtering targets like the CeMg Target play a crucial role in thin-film deposition processes across various industries. The controlled alloy composition enables precise film characteristics, which is paramount for applications in electronics and optics. Research often focuses on the interplay between material properties and deposition parameters to optimise performance.

The selection of sputtering targets is based on detailed technical specifications that ensure compatibility with high-vacuum systems and deposition equipment. Extensive testing, including in-situ monitoring and post-deposition analysis, helps validate material performance and guides process improvements in advanced manufacturing environments.