ST11178 Iron Cobalt Boron Rotary Target, CoFeB Target

Iron Cobalt Boron Rotary Target, CoFeB Target Description

Iron Cobalt Boron Rotary Target, CoFeB Target is an alloy target used in sputtering systems for thin film deposition. The controlled mixture of iron, cobalt, and boron aids in achieving consistent erosion and deposition characteristics. The rotary mechanism facilitates uniform target wear and helps maintain stable plasma conditions during sputtering. This design improves film uniformity and process repeatability in semiconductor and coating applications.

Iron Cobalt Boron Rotary Target, CoFeB Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Iron Cobalt Boron Rotary Target, CoFeB Target Applications

1.       Electronics Manufacturing
- Used as a sputtering source in semiconductor fabrication to achieve uniform film deposition by leveraging its controlled alloy composition.
- Applied in the formation of magnetic storage layers to attain stable magnetic properties by utilising its tailored microstructure.

2.       Display Technology
- Serves as a deposition target in display panel manufacturing to ensure consistent film thickness across active areas, addressing issues of non-uniform brightness with even erosion characteristics.
- Frequently used for coating transparent electrodes where uniform film properties mitigate resistive losses.

3.       Industrial Coating Processes
- Employed in the production of wear-resistant coatings on components to enhance surface performance by utilising its consistent sputtering rate.
- Provides solutions in large-area coating applications, improving process repeatability through its rotary design.

Iron Cobalt Boron Rotary Target, CoFeB Target Packing

The target is packaged in an anti-static, cushioned container to reduce mechanical shock and contamination during transit. It is sealed in moisture-resistant wrapping and provided with foam inserts to maintain stability. Proper storage in a dry, temperature-controlled environment is recommended. Customised packaging options, including additional labelling and compartmentalisation, are available upon request.

Additional Information

Understanding the metallurgical characteristics of iron-based alloys is essential in assessing their performance in sputtering applications. The incorporation of cobalt and boron adjusts the alloy's magnetic and mechanical properties, which is critical during thin film deposition processes. Material analysis using techniques such as SEM and spectroscopy aids in the validation of these properties.

In the broader context, advancements in sputtering technology have improved the deposition uniformity and processing speeds required for modern electronic and optical devices. Detailed knowledge of material properties and processing methods supports ongoing innovations in coating and semiconductor industries.