ST11179 Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target

Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target Description

Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target utilises a homogeneous Co-Fe-Ta-B alloy matrix formulated for sputtering applications. The planar design enhances uniform target erosion, ensuring consistent film deposition in semiconductor processing systems. Customisable dimensions allow compatibility with a range of equipment, while the controlled alloy composition minimises target poisoning and maintains steady deposition rates essential for precision thin film fabrication.

Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target Applications

1.       Electronics
   - Used as a sputtering source in semiconductor thin film deposition to achieve uniform coating by utilising the target's planar design.

2.       Industrial
   - Applied as a coating target in flat panel display production to attain consistent film properties through controlled alloy composition.

3.       Automotive
   - Employed as a sputtering target in sensor fabrication to enhance film uniformity by utilising customisable dimensions.

Cobalt Iron Tantalum Boron Planar Target, CoFeTaB Target Packing

The CoFeTaB Target is packaged in anti-static, cushioned containment to minimise mechanical damage and contamination. Each target is sealed to protect against moisture and particulate exposure during transport and storage. Packaging ensures maintenance of material integrity through temperature-controlled conditions. Optional vacuum sealing, specialised labelling, and custom compartmentalisation are available to meet specific industry requirements.

Additional Information

Sputtering targets are critical components in thin film deposition, where precise alloy compositions directly influence film uniformity and device performance. The utilisation of cobalt alloys in material science has been instrumental in advancing processes for semiconductor and display technologies.

Understanding the interplay of compositional control and target geometry facilitates improvements in process repeatability and deposition efficiency. Continuous advances in quality control and production techniques further refine the performance characteristics of these targets, fostering enhanced outcomes in high-precision manufacturing environments.